1999
DOI: 10.1134/1.1130739
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Motion of a planar domain wall in the ferroelectric-ferroelastic gadolinium molybdate

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Cited by 7 publications
(4 citation statements)
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“…After external field switch-off the action of E rd + E b leads to return of the domain wall to the initial state ("complete backswitching"). The experimentally obtained field dependence of the wall shift measured during step-by-step increase of E ex amplitude is fairly well described by Equation 4 [36].…”
Section: Materials and Experimental Conditionssupporting
confidence: 49%
See 1 more Smart Citation
“…After external field switch-off the action of E rd + E b leads to return of the domain wall to the initial state ("complete backswitching"). The experimentally obtained field dependence of the wall shift measured during step-by-step increase of E ex amplitude is fairly well described by Equation 4 [36].…”
Section: Materials and Experimental Conditionssupporting
confidence: 49%
“…In this case E b is codirectional with E rd in the switched area. The total field at the wall averaged over the sample thickness E loc coincides with the field produced by a stripe capacitor with the width equal to the wall shift x and the surface charge determined by the doubled bulk screening charge density 2σ b [34][35][36] …”
Section: Materials and Experimental Conditionsmentioning
confidence: 99%
“…For an explanation of the observed results, we have proposed a mechanism of the jerky wall motion. It is known 16,17 that the plane domain wall motion slows with the shift from the initial position. This effect is due to a reduction of the local field at the wall by a residual depolarization field E rd produced by bound charges in the newly switched area behind the moving domain wall and compensated partially by fast external screening.…”
mentioning
confidence: 99%
“…Previous work on PZT thin films has focused on processing methods and the resulting crystallographic, electric and dielectric properties. Relatively little attention has been paid to the morphological studies in PZT thin films and less in the fractal surface analysis [3].…”
Section: Introductionmentioning
confidence: 99%