Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography
Mathias Tomandl,
Christoph Spengler,
Peter Hudek
et al.
Abstract:Multi-beam mask writers (MBMWs) from IMS Nanofabrication disrupted the mask writing technology in the past decade by offering this technology to the industry with a range of benefits over the preceding variable shaped beam technology. The MBMW-101 enabled write times independent of the pattern complexity, usage of low sensitivity resists at high throughput, and superior resolution and critical dimension uniformity (CDU) capabilities. With these benefits, the technology enabled high volume extreme ultraviolet (… Show more
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