2018 7th Electronic System-Integration Technology Conference (ESTC) 2018
DOI: 10.1109/estc.2018.8546380
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Multi-Chip Patch in Low Stress Polymer Foils based on an Adaptive Layout for Flexible Sensor Systems

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Cited by 16 publications
(5 citation statements)
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“…If rotation occurs, the adaptive layout technique can be used for correction . This is enabled by the use of a laser direct writing system which, unlike conventional direct exposure systems, offers the possibility to mask-less exposure allowing the design to be changed and adapted within the entire processing . Another challenge is the spin-coating process.…”
Section: Resultsmentioning
confidence: 99%
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“…If rotation occurs, the adaptive layout technique can be used for correction . This is enabled by the use of a laser direct writing system which, unlike conventional direct exposure systems, offers the possibility to mask-less exposure allowing the design to be changed and adapted within the entire processing . Another challenge is the spin-coating process.…”
Section: Resultsmentioning
confidence: 99%
“…42 This is enabled by the use of a laser direct writing system which, unlike conventional direct exposure systems, offers the possibility to mask-less exposure allowing the design to be changed and adapted within the entire processing. 43 Another challenge is the spin-coating process. the accuracy of the laser direct writing system during the photolithographic structuring of the pad opening and the ensuing dry etching processes.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…The newest developed antenna and its RF-chip were produced using the chip-film patch (CFP) process, which is specifically developed by the Institut für Mikroelektronik Stuttgart (IMS-CHIPS) and is particularly suitable for manufacturing Hybrid Systems in Foil with a total thickness between 50 μm and 70 μm [18]. This wafer-level processing realizes combining silicon chips with large area electronics, such as organic thin-film transistors, sensors, and antennas with CMOS-compatible equipment.…”
Section: Chip-film Patch Processmentioning
confidence: 99%
“…Durimide provides the mechanical flexibility of the system-in-foil (SiF), reinforces the layer stack, and shifts the brittle BCB near the neutral line of stress. The two-polymer CFP technology is compatible with CMOS processing which enables a fine-pitch interconnectivity using photo-lithography and IC-production facilities (CMOS backend process) [6]. The schematic cross-section of the two-polymer ultra-thin chip embedding in the CFP technology is illustrated in Fig.…”
Section: Two-polymer Cfp Technologymentioning
confidence: 99%