2020
DOI: 10.1016/j.tsf.2019.137685
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Multi-component (Al,Cr,Nb,Y,Zr)N thin films by reactive magnetron sputter deposition for increased hardness and corrosion resistance

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Cited by 50 publications
(27 citation statements)
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“…The formation of nitride solid-solution could be attributed to the high entropy effect, which by increasing solubility, limits the formation of intermetallic phases between nitrogen and metallic elements [9]. Similar nitride phases were found in other HEN coatings [8,9,14]. Besides the main phase, some small peaks of fcc phases with slightly different lattice parameters are also present.…”
Section: Crystallographic Structurementioning
confidence: 56%
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“…The formation of nitride solid-solution could be attributed to the high entropy effect, which by increasing solubility, limits the formation of intermetallic phases between nitrogen and metallic elements [9]. Similar nitride phases were found in other HEN coatings [8,9,14]. Besides the main phase, some small peaks of fcc phases with slightly different lattice parameters are also present.…”
Section: Crystallographic Structurementioning
confidence: 56%
“…The first publication dealing with a reactive magnetron sputtering deposition of nitrides from the Al-Cr-Ta-Ti-Zr system already showed high hardness and elastic modulus, 32 and 368 GPa, respectively [7]. Later studies confirmed the very high mechanical resistance of other HENs, often reaching hardness values above 25 GPa [8][9][10]. Most HENs consist of a single phase of multielement NaCl-type face-centered cubic structure [11].…”
Section: Introductionmentioning
confidence: 99%
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“…In the past decades, the deposition of thin films has been a strategic alternative to provide improved surface properties. The development of protective layers on metallic substrates has enabled good wear resistance, [1][2][3][4][5][6][7][8][9][10] corrosion protection, [11][12][13][14][15][16][17][18][19][20][21][22][23][24] enhanced surface hardness, [25][26][27][28][29][30][31][32][33][34] and superior biocompatibility. [18,20,[35][36][37][38][39][40] Plasma deposition procedure is a promising technique that can be used to supply thin films, aiming at applications such as magnetron sputtering, [2,3,6,10,12,18,…”
Section: Introductionmentioning
confidence: 99%
“…In the past decades, the deposition of thin films has been a strategic alternative to provide improved surface properties. The development of protective layers on metallic substrates has enabled good wear resistance, [ 1–10 ] corrosion protection, [ 11–24 ] enhanced surface hardness, [ 25–34 ] and superior biocompatibility. [ 18,20,35–40 ]…”
Section: Introductionmentioning
confidence: 99%