2013
DOI: 10.1063/1.4823466
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Multi-dipolar microwave plasmas and their application to negative ion production

Abstract: During the past decade multi-dipolar plasmas have been employed for various purposes such as surface treatments in biomedicine, physical and chemical vapour deposition for hydrogen storage, and applications in mechanical engineering. On the other hand, due to the design and operational mode of these plasma sources (i.e., strong permanent magnets for the electron cyclotron resonance coupling, low working pressure, and high electron density achieved) they are suitable for studying fundamental mechanisms involved… Show more

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Cited by 43 publications
(45 citation statements)
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“…Copyright 2002 AIP Publishing LLC. 264 Camembert III was presented by B echu et al 159 Aleiferis et al 160 described the magnetic field of the network of five dipolar sources forming the source Prometheus and present the photo of the produced plasma.…”
Section: Volume Negative Ion Sources For Accelerator Applicationsmentioning
confidence: 99%
“…Copyright 2002 AIP Publishing LLC. 264 Camembert III was presented by B echu et al 159 Aleiferis et al 160 described the magnetic field of the network of five dipolar sources forming the source Prometheus and present the photo of the produced plasma.…”
Section: Volume Negative Ion Sources For Accelerator Applicationsmentioning
confidence: 99%
“…Negative-ion production on surfaces in low-pressure plasmas rely on two distinct mechanisms. Depending on where the ions are formed, one distinguishes volume production [1][2][3][4][5] associated with dissociative attachment of electrons on molecules and surface production associated with the capture of one or two electrons by neutral atoms or ions impinging on the surface. Depending on the targeted application, either surface or volume production can be the most favourable process.…”
Section: Introductionmentioning
confidence: 99%
“…Negative-ion (NI) production in low-pressure plasma has many applications and is studied in various areas, such as microelectronics 1,2,3,4,5,6 , magnetically confined fusion 7,8 , space propulsion 9,10,11 and sources for particle accelerators 12,13,14 . NI in low pressure plasmas are usually created by dissociative attachment of electrons on molecules (volume production) 15,16,17 , but they can also be created on surfaces by the bombardment of positive ions or hyperthermal neutrals 18,19,20,21,22,23,24 . Volume-produced NI sources are mainly used in microelectronic 1,2,3,4,5,6 and space propulsion applications 9,10,11 while surface production of NI is employed in magnetically confined fusion devices 7,8 and sources for particle accelerators 12,13,14 .…”
Section: Introductionmentioning
confidence: 99%