2019
DOI: 10.1016/j.jcrysgro.2019.125247
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Multi-scale modeling of gas-phase reactions in metal-organic chemical vapor deposition growth of WSe2

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Cited by 79 publications
(96 citation statements)
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“…Figure 1 summarizes the growth, structural, and optical characterization of the MOCVD grown MoS 2 and WS 2 . Figure 1a shows the schematic of the MOCVD system, comprising of a cold-wall horizontal reactor with an inductively heated graphite susceptor equipped with wafer rotation as previously described 27 . Molybdenum hexacarbonyl (Mo(CO) 6 ) and tungsten hexacarbonyl (W(CO) 6 ) were used as metal precursors, while hydrogen sulfide (H 2 S) was the chalcogen source with H 2 as the carrier gas.…”
Section: Resultsmentioning
confidence: 99%
“…Figure 1 summarizes the growth, structural, and optical characterization of the MOCVD grown MoS 2 and WS 2 . Figure 1a shows the schematic of the MOCVD system, comprising of a cold-wall horizontal reactor with an inductively heated graphite susceptor equipped with wafer rotation as previously described 27 . Molybdenum hexacarbonyl (Mo(CO) 6 ) and tungsten hexacarbonyl (W(CO) 6 ) were used as metal precursors, while hydrogen sulfide (H 2 S) was the chalcogen source with H 2 as the carrier gas.…”
Section: Resultsmentioning
confidence: 99%
“…An inductively heated graphite susceptor equipped with wafer rotation in a cold-wall horizontal reactor was used to achieve uniform monolayer deposition (schematic in Fig. 1a) as previously described 54 . Molybdenum hexacarbonyl (Mo(CO) 6 ) and hydrogen sulfide (H 2 S) were used as precursors.…”
Section: Synthesis Of Monolayer Mos 2 Monolayer Mos 2 Was Depositedmentioning
confidence: 99%
“…It was deposited on epi-ready 2" c-sapphire substrate by metalorganic chemical vapor deposition (MOCVD). An inductively heated graphite susceptor equipped with wafer rotation in a cold-wall horizontal reactor was used to achieve uniform monolayer deposition as previously described [65].…”
Section: Methodsmentioning
confidence: 99%