Multi-stage pulsed laser deposition of aluminum nitride at different temperatures

Duta, L.; Stan, George E.; Stroescu, Hermine; Gärtner, M.; Anastasescu, Mihai; Fogarassy, Zs.; Mihăilescu, Natalia; Szekeres, A.; Bakalova, S.; Mihăilescu, I. N.

doi:10.1016/j.apsusc.2015.10.093

Cited by 14 publications

(12 citation statements)

References 30 publications

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Section: Nanoindentation Testingmentioning

confidence: 99%

“…Below the loading value of 5 mN, the hardness determination with sufficient accuracy is limited by the surface roughness [39]. Our PLD AlN films exhibited a considerably smooth and uniform surface morphology, with a root mean squared roughness in the range of 0.24-2.5 nm, depending on the deposition conditions [35,36,40]. The variation of hardness with the indenter penetration depth points to a region of ∆hmax ≈ (150-200) nm, corresponding to 10-15 mN loading, where the H values of the films could be recorded with the weak influence of the Si substrate on the test measurements.…”

Section: Nanoindentation Testingmentioning

confidence: 99%

“…Thin AlN films synthesis by the PLD technique is also the subject of our research. We focused during the years on the influence of the technological parameters, such as the assisting nitrogen gas pressure, incident laser fluence, repetition rate of laser pulses, substrate temperature, and the presence of an additional matching sub-layer, on the physical properties of AlN films synthesized by PLD [23,[29][30][31][32][33][34][35][36] onto Si(100) substrates. Physical properties, such as surface roughness, microstructure, composition, amorphous-to-polycrystalline phase ratio, and optical constants appropriate for various applications, have been systematically studied.…”

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Deposition of Aluminum Nitride Films: Correlation between Mechanical, Optical, and Structural Properties

et al. 2019

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Aluminum nitride (AlN) films were synthesized onto Si(100) substrates by pulsed laser deposition (PLD) in vacuum or nitrogen, at 0.1, 1, 5, or 10 Pa, and substrate temperatures ranging from RT to 800 °C. The laser parameters were set at: incident laser fluence of 3–10 J/cm2 and laser pulse repetition frequency of 3, 10, or 40 Hz, respectively. The films’ hardness was investigated by depth-sensing nanoindentation. The optical properties were studied by FTIR spectroscopy and UV-near IR ellipsometry. Hardness values within the range of 22–30 GPa and Young’s modulus values of 230–280 GPa have been inferred. These values were determined by the AlN film structure that consisted of nanocrystallite grains, strongly dependent on the deposition parameters. The values of optical constants, superior to amorphous AlN, support the presence of crystallites in the amorphous film matrix. They were visualized by TEM and evidenced by FTIR spectroscopy. The characteristic Reststrahlen band of the h-AlN lattice with component lines arising from IR active phonon vibrational modes in AlN nanocrystallites was well detectable within the spectral range of 950–500 cm−1. Control X-ray diffraction and atomic force microscopy data were introduced and discussed. All measurements delivered congruent results and have clearly shown a correlation between the films’ structure and the mechanical and optical properties dependent on the experimental conditions.

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Section: Nanoindentation Testingmentioning

confidence: 99%

Section: Nanoindentation Testingmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Deposition of Aluminum Nitride Films: Correlation between Mechanical, Optical, and Structural Properties

et al. 2019

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“…Furthermore, in PLD, the deposited material exhibits an excellent adherence to substrate, with a controlled growth rate and without contaminations. This technique also ofers the possibility to deposit multi-layers and doped ilms with great versatility [54]. The variation in the experimental parameters ofers the possibility to deposit crystalline structures from various complex materials deposited at room temperature [55].…”

Section: Pulsed Laser Depositionmentioning

confidence: 99%

“…"n important feature of PLD is the stoichiometry preservation of the target in the deposited thin ilms by choosing proper ablation and deposition parameters [54,55]. Furthermore, in PLD, the deposited material exhibits an excellent adherence to substrate, with a controlled growth rate and without contaminations.…”

Section: Pulsed Laser Depositionmentioning

confidence: 99%

Laser Ablation of Biomaterials

Popescu-Pelin¹,

Ristoscu²,

Mihăilescu³

2016

Applications of Laser Ablation - Thin Film Deposition, Nanomaterial Synthesis and Surface Modification

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Abstract"iomaterials, deined by high biocompatibility and biodegradability, are intensively used in medical applications, mainly to replace partial or total, damaged or destroyed hard or soft tissues. Most of them are used not only as coatings for implant coverage but also as parts for some medical devices. In the last decades, researchers sought to ind the optimum processing methods and parameters to modify or deposit the biomaterial of interest. "n important family of techniques, used to process a biomaterial, is represented by laser techniques, based upon laser ablation phenomenon. Laser ablation of biomaterials ensures the transference or modiication with good precision and without or with minimal disruptions generated. To obtain thin coatings from biomaterials, one can use deposition techniques: pulsed laser deposition (PLD) or matrix-assisted pulsed laser evaporation (M"PLE). These techniques are chosen according to the selected biomaterial and desired performances of the obtained coating. Therefore, some sensitive biomaterials can be transferred only by M"PLE. Some results in the ield of calcium phosphates deposited by PLD or M"PLE are presented, proving the usefulness of these biomaterials for medical applications.

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Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Density During Target B4C Sputtering

Иващенко

Rogoz

Kołtunowicz

et al. 2019

Lecture Notes in Mechanical Engineering

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Multi-stage pulsed laser deposition of aluminum nitride at different temperatures

Cited by 14 publications

References 30 publications

Pulsed Laser Deposition of Aluminum Nitride Films: Correlation between Mechanical, Optical, and Structural Properties

Pulsed Laser Deposition of Aluminum Nitride Films: Correlation between Mechanical, Optical, and Structural Properties

Laser Ablation of Biomaterials

Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Density During Target B4C Sputtering

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