We investigated the structural, electrical, and optical properties of polycrystalline NbO2 thin films on glass substrates. The NbO2 films were crystallized from amorphous precursor films grown by pulsed laser deposition at various oxygen partial pressures (PO2). The electrical and optical properties of the precursor films systematically changed with PO2, demonstrating that the oxygen content of the precursor films can be finely controlled with PO2. The precursors were crystallized into polycrystalline NbO2 films by annealing under vacuum at 600 °C. The NbO2 films possessed extremely flat surfaces with branching patterns. Even optimized films showed a low resistivity (ρ) of 2 × 102 Ω cm, which is much lower than the bulk value of 1 × 104 Ω cm, probably because of the inferior crystallinity of the films compared with that of a bulk NbO2 crystal. Both oxygen‐rich and ‐poor NbO2 films showed lower ρ than that of the stoichiometric film. The NbO2 film with the highest ρ showed an indirect bandgap of 0.7 eV.