Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results

Spiga, D.; Pareschi, G.; Cotroneo, Vincenzo; Canestrari, R.; Vernani, Dervis; Mirone, Alessandro; Ferrero, C.; Ferrari, C.; Lazzarini, L.

doi:10.1117/1.2769325

Cited by 11 publications

(5 citation statements)

References 28 publications

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“…Several multilayer samples were deposited onto Silicon wafers to optimize the layer properties and to calibrate the deposition rate. The stack parameters were measured by XRR (X-Ray Reflectivity) angular scans at 8.045 keV ( Figure 5) and analyzed with the PPM program [14] . The very detailed fit returned an accurate stack description and matched a roughness value (4 Å) very close to that of the substrate (3 Å) for both W/Si and Pt/C multilayers.…”

Section: Multilayersmentioning

confidence: 99%

The optics system of the New Hard X-ray Mission: status report

et al. 2011

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The New Hard X-ray Mission (NHXM) is a space X-ray telescope project focused on the 0.2 to 80 keV energy band, coupled to good imaging, spectroscopic and polarimetry detectors. The mission is currently undergoing the Phase B study and it has been proposed to ESA as a small-size mission to be further studied in the context of the M3 call; even if the mission was not downselected for this call, its study is being continued by ASI. The required performance is reached with a focal length of 10 m and with four mirror modules, each of them composed of 70 NiCo electroformed mirror shells. The reflecting coating is a broadband graded multilayer film, and the focal plane is mounted onto an extensible bench. Three of the four modules are equipped with a camera made of two detectors positioned in series, a Silicon low energy detector covering the range 0.2 to 15 keV and a high energy detector based on CdTe sensitive from 10 keV up to 120 keV. The fourth module is dedicated to the polarimetry to be performed with enhanced imaging capabilities. In this paper the latest development in the design and manufacturing of the optics is presented. The design has been optimized in order to increase as much as possible the effective area in the high-energy band. The manufacturing of the mirror shells benefits from the latest development in the mandrel production (figuring and polishing), in the multilayer deposition and in the integration improvements.

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Section: Multilayersmentioning

confidence: 99%

The optics system of the New Hard X-ray Mission: status report

et al. 2011

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“…Lehnert et al observed the disappearance of multilayer stacking after processing the thin film at 600-873 K annealing temperature for 1.8 ks [80]. Multilayer deposition is successfully used in the manufacture of optical components for neutron supermirror and X-ray mirrors [81][82][83]. Multi-layered thin films are much more advantageous compared to the single deposited layered film as mentioned in the following [66]:…”

Section: Multilayer Ni/ti Thin Filmmentioning

confidence: 99%

A Critical Review on Nickel–Titanium Thin-Film Shape Memory Alloy Fabricated by Magnetron Sputtering and Influence of Process Parameters

Marupalli

Behera

Aich

2021

Trans Indian Inst Met

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This paper discussed the fundamentals of NiTi shape memory alloy and its applications in advanced scientific fields. Currently, the world is focusing on miniaturized systems for various industrial and functional applications. The thin-film shape memory NiTi alloy plays a crucial role in MEMS/NEMS industry in fabrication of microdevices. In this article, the NiTi phase diagram along with the shape memory effect and superelasticity has also been explained. Among several types of fabrication techniques for NiTi thin films, magnetron sputtering, which yields a better homogeneous film, has been discussed. Both the operational parameters (target type, Ar pressure, applied power, target-substrate distance, substrate rotation, substrate temperature, plasma stability, deposition rate) and the material's parameters (deposition pattern, orientation of adatom, film thickness, film stress, crystal structure, grain size, intermetallic formation, oxide formation, phase transformation) have been correlated in this article. The utilization of shape memory behavior in various industrial applications has been discussed here, also the advantages and limitations of SMA have been briefly discussed.

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“…To do this, we have used PPM [12] (Pythonic Program for Multilayers), a program able to accurately fit XRR curves, thereby extracting the multilayer structure in a very affordable way. [13] Fig. 11: theta-2theta XRR scans of (left) a Co/C multilayer sample and (right) a Cr/C sample.…”

Section: Multilayer Stack Analysismentioning

confidence: 99%

Testing multilayer-coated polarizing mirrors for the LAMP soft X-ray telescope

Spiga¹,

Salmaso

Sheng

et al. 2015

SPIE Proceedings

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The LAMP (Lightweight Asymmetry and Magnetism Probe) X-ray telescope is a mission concept to measure the polarization of X-ray astronomical sources at 250 eV via imaging mirrors that reflect at incidence angles near the polarization angle, i.e., 45 deg. Hence, it will require the adoption of multilayer coatings with a few nanometers dspacing in order to enhance the reflectivity. The nickel electroforming technology has already been successfully used to fabricate the high angular resolution imaging mirrors of the X-ray telescopes SAX, XMM-Newton, and Swift/XRT. We are investigating this consolidated technology as a possible technique to manufacture focusing mirrors for LAMP. Although the very good reflectivity performances of this kind of mirrors were already demonstrated in grazing incidence, the reflectivity and the scattering properties have not been tested directly at the unusually large angle of 45 deg. Other possible substrates are represented by thin glass foils or silicon wafers. In this paper we present the results of the X-ray reflectivity campaign performed at the BEAR beamline of Elettra -Sincrotrone Trieste on multilayer coatings of various composition (Cr/C, Co/C), deposited with different sputtering parameters on nickel, silicon, and glass substrates, using polarized X-rays in the spectral range 240 -290 eV.

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Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results

Cited by 11 publications

References 28 publications

The optics system of the New Hard X-ray Mission: status report

The optics system of the New Hard X-ray Mission: status report

A Critical Review on Nickel–Titanium Thin-Film Shape Memory Alloy Fabricated by Magnetron Sputtering and Influence of Process Parameters

Testing multilayer-coated polarizing mirrors for the LAMP soft X-ray telescope

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