Multilayer Laue Lens Growth at NSLS-II

Conley, Ray; Bouet, Nathalie; Lauer, Kenneth; Carlucci-Dayton, Mary; Biancarosa, J.; Boas, Larry; Drannbauer, J.; Feraca, John; Rosenbaum, Leonard; McNulty, Ian; Eyberger, Catherine; Lai, Barry

doi:10.1063/1.3625306

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Large Aperture Mll Optics Reaching the 100 M Mark1

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“…The device was deposited in the MLL deposition system at Brookhaven National Laboratory using four out of nine available cathodes. 61 The WSi 2 targets are identical in composition to previous work. The Aluminum targets included roughly 5% silicon (by weight).…”

Section: Large Aperture Mll Optics Reaching the 100 M Markmentioning

confidence: 99%

Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Bouet

Macrander

Mäser

et al. 2019

j nanosci nanotechnol

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Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 m range, to real beamline-deployed optics with apertures in the 40-50 m range (X. Huang, et al., Scientific

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Section: Large Aperture Mll Optics Reaching the 100 M Markmentioning

confidence: 99%