Multilayer X-ray interference structures

Лидер, В. В.

doi:10.3367/ufne.2018.10.038439

Cited by 3 publications

(1 citation statement)

References 510 publications

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“…To tackle this challenge, optical elements can be realized by using periodic multilayers made of alternating light and heavy layers with optimized periodicity d [6][7][8]. The constructive interference of multiple reflections from the interfaces is analogous to a Bragg reflection from the crystals.…”

Section: Introductionmentioning

confidence: 99%

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Hassebi,

Meltchakov,

Delmotte

et al. 2024

Applied Sciences

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This paper presents an X-ray reflectivity study of a Sc/SiC/Al periodic multilayer deposited via magnetron sputtering and its possible adaptation to be used as a dispersive element in the crystal spectrometers equipping scanning electron microscopes and electron probe microanalyzers. This multilayer is designed for the spectral range of 45–60 eV. The results reveal a reflectance of 40.8% at 54.1 eV for a near-normal incidence angle of 7° with a narrow bandwidth of 2.6 eV. The measured and simulated reflectivity curves are very close, suggesting that this system has smooth interfaces and low interdiffusion. Owing to the growing importance of lithium and lack of spectroscopic data, we simulate a new Sc/SiC/Al stack based on the reflectivity data and optimize it to perform spectroscopy in the range near the Li K absorption edge around 55 eV, which is in the spectral range of the Li Kα emission band. This optimization is achieved by tuning the thicknesses of the different layers and the number of periods of the multilayer using an in-house Python script. The optimization results are compared with the performances of other multilayers employed in the same energy range and at a working angle close to 30° grazing, including Be/Si/Al. This analysis indicates that the Sc/SiC/Al multilayer could be a good candidate for performing spectroscopy in the Li K range.

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Section: Introductionmentioning

confidence: 99%

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Hassebi,

Meltchakov,

Delmotte

et al. 2024

Applied Sciences

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Hard X-ray HfO2/Al2O3 multilayers fabricated by atomic layer deposition

Li,

Lu,

et al. 2024

Thin Solid Films

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Structural and optical performance of NiV/Ti multilayer mirrors for Z-pinch plasma diagnostic at the wavelength region of 350–450 eV

Wang,

Zhang,

et al. 2024

Opt. Lett.

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This Letter reports on investigations of novel, to the best of our knowledge, NiV(Ni93V7)/Ti multilayer mirrors for the operation in the wavelength region of 350–450 eV. Such mirrors are promising optical components for the Z-pinch plasma diagnostic. The NiV/Ti multilayers show superior structural and optical performance compared to conventional Ni/Ti multilayers. Replacing Ni with NiV in multilayers decreases interface widths and enhances the contrast of the refractive index between the absorber and spacer layers. The improvement of interface quality contributes to the enhancement in reflectance. Under the grazing incidence of 13°, a peak reflectivity of 25.1% at 429 eV is achieved for NiV/Ti multilayers, while 17.7% at 427 eV for Ni/Ti.

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Multilayer X-ray interference structures

Abstract: Functional principles, current status, and problems of multilayer X-ray optics are reviewed. Methods to optimize planar multilayer interference structures and multilayer diffraction gratings and their application in academic research and technology are discussed.

Cited by 3 publications

References 510 publications

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Hard X-ray HfO2/Al2O3 multilayers fabricated by atomic layer deposition

Structural and optical performance of NiV/Ti multilayer mirrors for Z-pinch plasma diagnostic at the wavelength region of 350–450 eV

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