2019
DOI: 10.1016/j.spmi.2019.106173
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Multimode AFM analysis of aluminum-doped zinc oxide thin films sputtered under various substrate temperatures for optoelectronic applications

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Cited by 18 publications
(4 citation statements)
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“…The bandgap of the ZnO nanorods was obtained from the Tauc equation, 73 αhν = A(hν − E g ) m , where α is the absorption coefficient, hν represents the photon energy, A is a constant, E g is the bandgap, and m is 1 2 for direct electron transition in semiconductors. By fitting a line to (αhν) 2 as a function of hν, the energy bandgap of the ZnO nanorods was obtained.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…The bandgap of the ZnO nanorods was obtained from the Tauc equation, 73 αhν = A(hν − E g ) m , where α is the absorption coefficient, hν represents the photon energy, A is a constant, E g is the bandgap, and m is 1 2 for direct electron transition in semiconductors. By fitting a line to (αhν) 2 as a function of hν, the energy bandgap of the ZnO nanorods was obtained.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…5 × 10 14 ion cm −2 , 8 × 10 14 ion cm −2 and 1 × 10 15 ion cm −2 average transmittance in the visible region was observed to be greater than the pristine substrates and found to be nearly 89.50%, 90.10%, and 91.2% respectively. According to Burstein-Moss theory, this increment in transmittance may be attributed due to change in carrier concentration at higher fluence, as is also observed by Hall measurements [42]. The other possible reason for the variation in transmittance may be due to the change in crystallites size, enhancement in oxygen concentration and/or the type of defects offered by the ion irradiation [19].…”
Section: Effects Of Ion Irradiation On Fto Substratesmentioning
confidence: 60%
“…Thus it can be inferred that ion irradiation leads to the simultaneous increase in the value of ρ as well as R s with increasing ion fluence. The possible reason of the increase in ρ and R s may be due to the formation of ion induced defects, grain boundary, surface roughness, and various other defects that scatter the carriers [10,42].…”
Section: Effects Of Ion Irradiation On Fto Substratesmentioning
confidence: 99%
“…[9,[15][16][17] The resistivity of aluminum-doped zinc oxide (AZO) in the order of 10 À4 Ω cm, together with its transparency of more than 90%, as well as nontoxicity, biocompatibility, availability of precursors, stability, and roll-to-roll production capability, have made it as the best alternative for ITO. [18,19] To prepare AZO thin films, a variety of deposition techniques have been used ranging from solution-based methods to vacuum-based deposition processes. Although magnetron sputtering is considered as the most convenient preparation method of AZO thin films, the industrial production is greatly limited with expensive vacuum deposition approaches, leading to an interest in solution-based AZO thin films.…”
Section: Introductionmentioning
confidence: 99%