2017
DOI: 10.1002/elps.201700329
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Multiple consecutive recapture of rigid nanoparticles using a solid‐state nanopore sensor

Abstract: Solid-state nanopore sensors have been used to measure the size of a nanoparticle by applying a resistive pulse sensing technique. Previously, the size distribution of the population pool could be investigated utilizing data from a single translocation, however, the accuracy of the distribution is limited due to the lack of repeated data. In this study, we characterized polystyrene nanobeads utilizing single particle recapture techniques, which provide a better statistical estimate of the size distribution tha… Show more

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Cited by 20 publications
(24 citation statements)
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“…Our findings demonstrate the capability of single‐particle studies with nanopore resistive pulse sensing. Since the manual control of the voltage switch has its limitation and can lead to errors, an automated recapture platform using a feedback control system is preferable for future recapture experiments . The automated setup can recapture single virus for multiple times, which will allow us to examine large amount of recapturing data from a single analyte conferring the deformability value with higher fidelity.…”
Section: Resultsmentioning
confidence: 99%
“…Our findings demonstrate the capability of single‐particle studies with nanopore resistive pulse sensing. Since the manual control of the voltage switch has its limitation and can lead to errors, an automated recapture platform using a feedback control system is preferable for future recapture experiments . The automated setup can recapture single virus for multiple times, which will allow us to examine large amount of recapturing data from a single analyte conferring the deformability value with higher fidelity.…”
Section: Resultsmentioning
confidence: 99%
“…A ∼180 nm thick silicon nitride ( S i x N y ) film was grown on both sides of a 500 μm thick, 4‐inch diameter, p‐type <100> silicon wafer using low‐pressure chemical vapor deposition. A section of the Si x N y film on the underside of the silicon wafer was etched using a conventional photolithography protocol . The exposed area of the silicon wafer was then further etched by a KOH wet etching protocol resulting in a 70 × 70 μm 2 free‐standing Si x N y membrane supported on the silicon wafer (Supporting Information Fig.…”
Section: Methodsmentioning
confidence: 99%
“…The nanoscale vesicles, due to their extremely small size, present experimental challenges in sample preparation, concentration bounds, measurement optimization, and scanning throughput. In this paper, we suggest a new technique involving a label‐free, non‐destructive, high throughput, single particle sensing solid‐state nanopore platform with recapturing capability to overcome difficulties associated with classical methods.…”
Section: Introductionmentioning
confidence: 99%
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“…For the analysis of charged macromolecules inside nanochannels, it is often desirable to make most of the applied voltage drop across the nanochannel . The most typical device structure is as shown in Fig.…”
Section: Introductionmentioning
confidence: 99%