Molecular doping is a key technique for fl exible and low-cost organic complementary semiconductor technologies that requires both effi cient and stable p-and n-type doping. However, in contrast to molecular p-dopants, highly effi cient n-type dopants are commonly sensitive to rapid degradation in air due to their low ionization energies ( IE s) required for electron donation, e.g., IE = 2.4 eV for tetrakis(1,3,4,6,7,8-hexahydro-2H -pyrimido[1,2-a ]pyrimidinato) ditungsten(II) (W 2 (hpp) 4 ). Here, the air stability of various host:W 2 (hpp) 4 combinations is compared by conductivity measurements and photoemission spectroscopy. A partial passivation of the n-doping against degradation is found, with this effect identifi ed to depend on the specifi c energy levels of the host material. Since host-W 2 (hpp) 4 electronic wavefunction hybridization is unlikely due to confi nement of the dopant highest occupied molecular orbital (HOMO) to its molecular center, this fi nding is explained via stabilization of the dopant by single-electron transfer to a host material whose energy levels are suffi ciently low for avoiding further charge transfer to oxygen-water complexes. Our results show the feasibility of temporarily handling n-doped organic thin fi lms in air, e.g., during structuring of organic fi eld effect transistors (OFETs) by lithography.