Abstract:N-polar GaN/AlN resonant tunneling diodes are realized on single-crystal N-polar GaN bulk substrate by plasma-assisted molecular beam epitaxy growth. The room-temperature current-voltage characteristics reveal a negative differential conductance (NDC) region with a peak tunneling current of 6.8 ± 0.8 kA/cm 2 at a forward bias of ∼8 V. Under reverse bias, the polarizationinduced threshold voltage is measured at ∼ −4 V. These resonant and threshold voltages are well explained with the polarization field which is… Show more
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