N+ silicon solar cells emitters realized using phosphoric acid as doping source in a spray process

Totally Vacuum-Free Processed Crystalline Silicon Solar Cells over 17.5% Conversion Efficiency

“…Silicon wafers then were dipped into the 20% diluted HF for 10 min and rinsed in distilled water. Afterwards, RCA cleaning [19,20] was carried out to remove contaminant particles on the surface of the wafers by using a NH 3 TiO 2 ARC films were formed on the surface of wafers by spray pyrolysis deposition technique with a glass atomizer using precursor solutions. Deposited film thicknesses were mainly controlled by the amount of sprayed precursor solutions.…”

“…Other than POCl 3 diffusion, diluted orthophosphoric acid (H 3 PO 4 ) by spray [3,4], sol-gel sources through spin-on deposition techniques [5], or screen-printing technique [6] can be some alternatives.…”

Investigation on phosphorus doping using H3PO4 as doping source by simple dip method and its electrical characterisation

“…It is clear that butanol exhibited better uniformity. The calculated standard deviation of sheet resistance was ,10 V/% for butanol, however, this is higher compared to that of Voyer et al 2 and Bouhafs et al 12 This can be minimised by varying parameters such as the concentration of the emulsion, the dipping time and the diffusion temperature. Based on the present study, the authors conclude that via the use of butanol and ethanol, it is possible to obtain a better n z emitter layer for solar cell applications.…”

“…The authors found that butanol has favourable surface coverage and based on the electrical measurements it is clear that it is a candidate for diluting H 3 PO 4 for emitter layer preparation. Bouhafs et al also determined that butanol is a better diluent for H 3 PO 4 12. Butanol has boiling point of 117uC, which is high compared with ethanol and methanol.…”

Fabrication and characterization of thin c-Si solar cells by low cost methods

“…Spray coating and its subsequent on-line furnace diffusion is a suitable technique for thin cells emitter diffusion, as it reduces cell handling and increases process throughput. In this work, there have been prepared c-Si solar cells on thin substrates (100 -120 µm), by means of low cost methods, suitable for industrial application like spray coating and screen printing [5][6]. One of the side objectives of this study lies in the development of a safer and environmentally friendly processes; the use of an aqueous precursor seems a suitable alternative to meet these requirements.…”