2009
DOI: 10.1149/1.3065976
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n-Type Cu[sub 2]O by Electrochemical Doping with Cl

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Cited by 56 publications
(55 citation statements)
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“…However, we note here that there is no change in the carrier density. On the other hand, the resistivity of the film grown on bare Si (10 6 X cm) is in the range of the value reported in the literature (&10 5 -10 8 ) X cm [28,29]. While the resistivity of the film grown with SLAE slightly reduced to &10 4 X cm due to enhancement in the crystal structure of the film.…”
Section: Resultsmentioning
confidence: 49%
“…However, we note here that there is no change in the carrier density. On the other hand, the resistivity of the film grown on bare Si (10 6 X cm) is in the range of the value reported in the literature (&10 5 -10 8 ) X cm [28,29]. While the resistivity of the film grown with SLAE slightly reduced to &10 4 X cm due to enhancement in the crystal structure of the film.…”
Section: Resultsmentioning
confidence: 49%
“…This theoretical result is also supported by various experimental results. [193][194][195] 6.2. Doping of Cu I -Based p-TCO…”
Section: N-type Dopingmentioning
confidence: 99%
“…Recognizing that oxygen vacancies contribute to p-type semiconductor behavior in Cu 2 O, more recent studies by Tao and co-workers [299,300] have prepared p-n homojunctions from Cu 2 O by controlling solution pH during cathodic film growth. A subsequent study by the same group reports n-type doping of Cu 2 O by adding a chlorine precursor (CuCl 2 ) to the deposition bath [301]. Another group also uses solution pH as a tool to prepare n-type Cu 2 O electrodes [302].…”
Section: Copper Oxide (Cu 2 O)mentioning
confidence: 99%