2007
DOI: 10.1016/j.nimb.2006.12.116
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Nano-cluster formation in Ge+Sn implanted SiO2 layers

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(2 citation statements)
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“…On elevating the annealing temperature, the absorption related to the Si-O-Si bending mode (around 800 cm −1 ) becomes stronger while the Si-O rocking mode located at 460 cm −1 shifts a little toward the high energy side, which is also interpreted to be the effect of condensation and compaction of the SiO 2 framework. The peak centered at around 1100 cm −1 is attributed to the AS1-TO mode of Si-O-Si [12], which is magnified in figure 2 It is supposed that only In 2 O 3 clusters are formed in this situation [14,15]. As the temperature increases to 900 • C, the XRD intensity increases and the (012) diffraction peak appears.…”
Section: Resultsmentioning
confidence: 92%
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“…On elevating the annealing temperature, the absorption related to the Si-O-Si bending mode (around 800 cm −1 ) becomes stronger while the Si-O rocking mode located at 460 cm −1 shifts a little toward the high energy side, which is also interpreted to be the effect of condensation and compaction of the SiO 2 framework. The peak centered at around 1100 cm −1 is attributed to the AS1-TO mode of Si-O-Si [12], which is magnified in figure 2 It is supposed that only In 2 O 3 clusters are formed in this situation [14,15]. As the temperature increases to 900 • C, the XRD intensity increases and the (012) diffraction peak appears.…”
Section: Resultsmentioning
confidence: 92%
“…It is difficult and inappropriate to estimate the particle size through the XRD peaks due to its low XRD intensity. It is supposed that only In 2 O 3 clusters are formed in this situation [14,15]. As the temperature increases to 900 • C, the XRD intensity increases and the (012) diffraction peak appears.…”
Section: Resultsmentioning
confidence: 99%