Nano-diamond films deposited by direct current glow discharge assisted chemical vapor deposition

Heiman, A.; Gouzman, I.; Christiansen, Silke; Strunk, H. P.; Hoffman, A.

doi:10.1016/s0925-9635(00)00193-x

Cited by 33 publications

(11 citation statements)

References 25 publications

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“…NCD films exhibit a continuous variation in material properties and defect concentrations which depend on the growth methods, reactant species, substrate temperature, and reactor pressure. The methods include plasma-enhanced (PE)CVD (microwave, [9,12,[14][15][16]20,21,78,84,85] electron cyclotron resonance, [23][24][25] DC glow discharge, [86,87] and hot filament-assisted CVD. [88][89][90][91][92] In Table 1 several subclasses of NCD were identified based on the use of higher methane concentrations (1-4% CH 4 in H 2 ), [74] biased plasma (energetic ion flux), [77,78] nitrogen addition, [82,93] and very low CH 4 concentrations (0.1 to 0.5% CH 4 in H 2 ).…”

Section: Historical Overviewmentioning

confidence: 99%

The CVD of Nanodiamond Materials

Butler

Sumant

2008

Chemical Vapor Deposition

340

261

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The growth and characteristics of nanocrystalline diamond thin films with thicknesses from 20 nm to less than 5 mm are reviewed. These materials contain between 95% and >99.9% diamond crystallites, the balance being made up from other forms of carbon. Within this class of materials there is a continuous range of composition, characteristics, and properties which depend on the nucleation and growth conditions. It is convenient to classify these films as either ultra-nanocrystalline-diamond (UNCD) or nanocrystalline-diamond (NCD) based on their microstructure, properties, and growth environment. In general, UNCD materials are composed of small particles of diamond ca. 2-5 nm in size with sp 2 -carbon bonding between the particles. UNCD is usually grown in argon-rich, hydrogen-poor CVD environments, and may contain up to 95-98% sp 3 -bonded carbon. NCD materials start with high density nucleation, initiating nanometer-sized diamond domains which grow in a columnar manner with the grain size coarsening with thickness. NCD is generally grown in carbon-lean and hydrogen-rich environments. NCD and UNCD exhibit an interesting range of physical properties which find use in X-ray windows and lithography, micro-and nanomechanical and optical resonators, tribological shaft seals and atomic force microscopy (AFM) probes, electron field emitters, platforms for chemical and DNA sensing, and many other applications.

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Section: Historical Overviewmentioning

confidence: 99%

The CVD of Nanodiamond Materials

Butler

Sumant

2008

Chemical Vapor Deposition

340

261

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“…Cyclotron Resonance [138,139], DC Glow Discharge [140,141] and HFCVD [142][143][144][145][146]. They are typically grown in hydrogen-rich, carbon lean environments, with surface temperatures between 250 and 1000 ºC and pressures higher than 660 Pa [130].…”

Section: Ncd Film Growthmentioning

confidence: 99%

Diamond growth by chemical vapour deposition

Grácio¹,

Fan²,

Madaleno³

2010

J. Phys. D: Appl. Phys.

255

156

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This paper reviews the growth of diamond by chemical vapour deposition (CVD). It includes the following seven parts: (1) Properties of diamond: this part briefly introduces the unique properties of diamond and their origin and lists some of the most common diamond applications. (2) Growth of diamond by CVD: this part reviews the history and the methods of growing CVD diamond. (3) Mechanisms of CVD diamond growth: this part discusses the current understanding on the growth of metastable diamond from the vapour phase. (4) Characterization of CVD diamond: we discuss the two most common techniques, Raman and XRD, which have been intensively employed for characterizing CVD diamond. (5) CVD diamond growth characteristics: this part demonstrates the characteristics of diamond nucleation and growth on various types of substrate materials. (6) Nanocrystalline diamond: in this section, we present an introduction to the growth mechanisms of nanocrystalline diamond and discuss their Raman features. This paper provides necessary information for those who are starting to work in the field of CVD diamond, as well as for those who need a relatively complete picture of the growth of CVD diamond.

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“…Chemical vapor deposition (CVD) and plasma assisted CVD have now been proven to be an effective deposition technique for a variety of carbon materials including diamond and graphene. − Among the CVD techniques, the focus is on direct current microplasma technique (DCμP). This technique is based on the micro-hollow-cathode effect, which allows production of a high density plasma (up to 10 16 cm –3 ) and has the ability to start the discharge at relatively high pressures (close or equal to atmospheric pressure) .…”

Section: Introductionmentioning

confidence: 99%

Carbon Structures Grown by Direct Current Microplasma: Diamonds, Single-Wall Nanotubes, and Graphene

et al. 2014

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Plasma assisted CVD is now an established technique for the growth of a variety of dielectrics and semiconductors. The versatility of an in-house developed direct-current (dc) microplasma deposition system is demonstrated here for the growth of a wide range of carbon-based materials. Diamond, nanodiamond, nanocrystalline graphite, single-wall carbon nanotubes, and few-layer graphene have been deposited using the same dc microplasma deposition system using 0.5% CH4/H2 gas feed, but changing only the substrate temperature (in the range 500−1150 °C) and the total pressure (0.3−200 Torr). The different structures have been characterized by scanning electron microscopy and micro-Raman spectroscopy. The experimental data have been interpreted from a thermodynamic point of view by applying a nonequilibrium nondissipative model. Nonequilibrium phase diagrams are presented and compared to the experimental data to provide a wide-ranging interpretation scenario

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Nano-diamond films deposited by direct current glow discharge assisted chemical vapor deposition

Cited by 33 publications

References 25 publications

The CVD of Nanodiamond Materials

The CVD of Nanodiamond Materials

Diamond growth by chemical vapour deposition

Carbon Structures Grown by Direct Current Microplasma: Diamonds, Single-Wall Nanotubes, and Graphene

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