2001
DOI: 10.1063/1.1385582
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Nano-oxidation of silicon surfaces: Comparison of noncontact and contact atomic-force microscopy methods

Abstract: Articles you may be interested inHigh aspect ratio nano-oxidation of silicon with noncontact atomic force microscopy

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Cited by 127 publications
(77 citation statements)
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“…264 Well documented examples include nanooxidation of metals and semiconductors. [264][265][266][267][268][269][270][271] Remarkably, even such non-classical processes as formation of silicon carbide from silicon oxide and ethanol under 20V bias were documented. [272][273][274][275][276] Note that unlike classical electrochemistry in planar electrode cells (or devices), the electric field falls away from the tip surface junction, precluding classical electrical breakdown and enabling unusual reactions to occur at high biases.…”
Section: C Tip Induced Electrochemical Writingmentioning
confidence: 99%
“…264 Well documented examples include nanooxidation of metals and semiconductors. [264][265][266][267][268][269][270][271] Remarkably, even such non-classical processes as formation of silicon carbide from silicon oxide and ethanol under 20V bias were documented. [272][273][274][275][276] Note that unlike classical electrochemistry in planar electrode cells (or devices), the electric field falls away from the tip surface junction, precluding classical electrical breakdown and enabling unusual reactions to occur at high biases.…”
Section: C Tip Induced Electrochemical Writingmentioning
confidence: 99%
“…Pulsed biasing have shown to provide a better height/width aspect ratio [17] for the oxide lines with respect to DC biasing, while operating the AFM in intermittent contact mode, preserves the metal covered tip from rapid erosion [18] with respect to contact mode for which large electrostatic forces are superimposed to the tip. This direct-write patterning technique can be used as a single "negative" fabrication step without further processing since the oxidized areas becomes insulating.…”
Section: Materials and Techniquesmentioning
confidence: 99%
“…[1][2][3][4] This method is based on the field-induced activation of molecules within a water meniscus and the subsequent oxidation of the sample surface. [5][6][7] Local oxidation nanolithography has been applied to fabricate nanoscale electronic devices, 8,9 microelectromechanical systems 10 or templates for the direct growth of single-molecule magnets 11 or metallic nanoparticles. 12,13 Local oxidation is compatible with imprinting techniques, thus enables the patterning of large areas has been demonstrated.…”
mentioning
confidence: 99%