Nano-pyramid arrays for nano-particle trapping

Sun, Xingwu; Veltkamp, Henk-Willem; Berenschot, J.W.; Gardeniers, Han; Tas, Niels Roelof

doi:10.1109/memsys.2016.7421589

Cited by 1 publication

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“…Assuming a 2 Hz bandwidth on a sample with height variations of 1 µm, with 50 nm asymmetry, the cross width has to remain above 500 nm. This is far away from the 26 nm that can be achieved by corner lithography (Sun et al, 2016). This implies that not only the photomask, but the entire lithography step has to be improved.…”

Section: Discussionmentioning

confidence: 90%

Batch fabricated scanning Hall probes by corner lithography

Hatakeyama¹

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In this chapter, I discuss nanometer sized Hall crosses on cantilever probes, fabricated by means of corner lithography. Scanning attempts on a permanent magnet show a strong topographic cross-talk. As this cross-talk was three orders of magnitude larger than the expected Hall signal, magnetic imaging over such a rough surface was impossible. We investigated the origin of the cross-talk by four different methods. These measurements clearly show that the asymmetry in the Hall cross, caused by fabrication imperfections, leads to an extra series resistance between the voltage sensing leads, resulting in an offset voltage on top of the output signal. Since this additional resistance is temperature dependent, the offset voltage varies with probe temperature. As the probe is heated by Joule heating, its temperature varies with probe-sample distance. This distance is slightly modulated due to topography of the sample while scanning, resulting in the observed strong topographic cross-talk. This work is a team effort by Edin Saraijlic, Martin Siekman and myself. My contribution is the theoretical model, the experiments and their analysis. The scanning Hall probes were fabricated by Edin Sarajlic. Martin Siekman assisted in construction of the measurement setup.

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Section: Discussionmentioning

confidence: 90%

Batch fabricated scanning Hall probes by corner lithography

Hatakeyama¹

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Nano-pyramid arrays for nano-particle trapping

Cited by 1 publication

References 3 publications

Batch fabricated scanning Hall probes by corner lithography

Batch fabricated scanning Hall probes by corner lithography

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