2008
DOI: 10.1002/adfm.200601189
|View full text |Cite
|
Sign up to set email alerts
|

Nanocarving of Titania as a Diffusion‐Driven Morphological Instability

Abstract: Under strongly reducing conditions at high temperatures titania develops a specific surface morphology, comprising a regular array of fibers with a diameter in the sub‐micrometer range. By a chemical diffusion experiment in a defined oxygen potential gradient it is shown that this surface structuring is caused by a diffusion‐driven morphological instability of an advancing reaction front (surface). The kinetics of the process is analyzed in terms of linear transport equations. The conditions for the occurrence… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2012
2012
2012
2012

Publication Types

Select...
1

Relationship

1
0

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 33 publications
0
1
0
Order By: Relevance
“…Alternatively (case ii), re-oxidation of oxygen deficient TiO 2Àd could be due to an inward flux of holes and an outward flux of titanium interstitials Ti I . For the latter case, evidence has been reported in the literature derived from the observation of the formation of new surface morphologies upon reduction of oxidized TiO 2 39 and upon oxidation of reduced TiO 2 . 40,41 The local electroneutrality requires the coupling of the fluxes in the oxidized region according to…”
Section: Oxidation Kinetics Of N-doped Tio 2àd Thin Filmsmentioning
confidence: 89%
“…Alternatively (case ii), re-oxidation of oxygen deficient TiO 2Àd could be due to an inward flux of holes and an outward flux of titanium interstitials Ti I . For the latter case, evidence has been reported in the literature derived from the observation of the formation of new surface morphologies upon reduction of oxidized TiO 2 39 and upon oxidation of reduced TiO 2 . 40,41 The local electroneutrality requires the coupling of the fluxes in the oxidized region according to…”
Section: Oxidation Kinetics Of N-doped Tio 2àd Thin Filmsmentioning
confidence: 89%