2014
DOI: 10.1063/1.4866155
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Nanochannel fabrication by imprinting-induced cracks

Abstract: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-dep… Show more

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Cited by 7 publications
(1 citation statement)
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“…At present, the fabrication methods for nano-channels mainly include high-resolution machining technology [ 13 , 14 , 15 ], sacrificing layer technology [ 16 , 17 ], the crack method [ 18 , 19 ], PDMS deformation [ 20 , 21 ], molecular self-assembly [ 22 , 23 , 24 ], and nano-imprinting technology [ 25 , 26 , 27 ]. The high-resolution machining technology mentioned above uses nanoscale resolution to expose or directly write nano-channels on the substrate, which provides the advantages of flexibility, controllability, high accuracy, and good quality.…”
Section: Introductionmentioning
confidence: 99%
“…At present, the fabrication methods for nano-channels mainly include high-resolution machining technology [ 13 , 14 , 15 ], sacrificing layer technology [ 16 , 17 ], the crack method [ 18 , 19 ], PDMS deformation [ 20 , 21 ], molecular self-assembly [ 22 , 23 , 24 ], and nano-imprinting technology [ 25 , 26 , 27 ]. The high-resolution machining technology mentioned above uses nanoscale resolution to expose or directly write nano-channels on the substrate, which provides the advantages of flexibility, controllability, high accuracy, and good quality.…”
Section: Introductionmentioning
confidence: 99%