2006
DOI: 10.1016/j.jlumin.2005.10.007
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Nanocrystal and interface defects related photoluminescence in silicon-rich Al2O3 films

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Cited by 33 publications
(17 citation statements)
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“…The obtained spectra were converted by the Kubelka-Munk function F(R) into absorption spectra, using BaSO 4 as a white standard. Optical band gaps (E g ) were obtained via the Tauc-plot method [15][16][17][18][19] using the calculation α = A(hν − E g ) n /hν, where α is the absorption coefficient, A is a constant, hν is the energy of light, and n = 2 or 0.5 for materials with indirect or direct transition, respectively. Assuming the absorption coefficient α being proportional to the KubelkaMunk function F(R), the E g can be obtained from the plot of [F(R)hν] 1/n versus hν, by extrapolation of the linear part near the onset of the absorption edge to intersect the energy axis.…”
Section: Synthesis Of Materialsmentioning
confidence: 99%
“…The obtained spectra were converted by the Kubelka-Munk function F(R) into absorption spectra, using BaSO 4 as a white standard. Optical band gaps (E g ) were obtained via the Tauc-plot method [15][16][17][18][19] using the calculation α = A(hν − E g ) n /hν, where α is the absorption coefficient, A is a constant, hν is the energy of light, and n = 2 or 0.5 for materials with indirect or direct transition, respectively. Assuming the absorption coefficient α being proportional to the KubelkaMunk function F(R), the E g can be obtained from the plot of [F(R)hν] 1/n versus hν, by extrapolation of the linear part near the onset of the absorption edge to intersect the energy axis.…”
Section: Synthesis Of Materialsmentioning
confidence: 99%
“…[16]. The broad PL spectrum can be considered as overlapping of several PL bands (similar to the case of CA treatment).…”
Section: Resultsmentioning
confidence: 99%
“…For these systems, the successful Si-nc formation was already demonstrated. However, in spite of the relative simplicity of magnetron sputtering technique and its wide application for the fabrication of Si-rich SiO 2 materials [5,8], only few groups applied this method for deposition of Si-rich alumina [16]. …”
Section: Introductionmentioning
confidence: 99%
“…The stresses, which bring about the breaking of chem ical bonds and the generation of nonradiative recom bination centers, can be responsible for the absence of typical photoluminescence (in the wavelength range 650-900 nm) of Si nanocrystals formed in the crystal line Al 2 O 3 (sapphire) matrix [10,11]. At the same time, the film variant of the Al 2 O 3 : NC Si system exhibits a characteristic photoluminescence in the near infrared (IR) spectral region, which is associ ated, in particular, with the possibility of oxidizing the surface of Si nanocrystals [12]. In our previous work [11], we have suggested that it is the formation of SiO x shells around nanocrystals that provides relaxation of stresses and photoluminescence in the Si nanocrystals ion synthesized in the initially amorphous Al 2 O 3 films.…”
Section: Introductionmentioning
confidence: 99%