2010
DOI: 10.1103/physrevb.82.125460
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Nanocrystalline diamond film growth on plastic substrates at temperatures below100°Cfrom low-temperature plasma

Abstract: Nanocrystalline diamond films have been successfully synthesized on plastic substrates at substrate temperatures below 100°C using a microwave plasma chemical-vapor deposition technique. This has been realized by using low reaction-gas pressures and a surface-wave plasma with a low-electron temperature over the growth region. The nanocrystalline diamond films exhibit growth rates with much lower temperature dependence than conventional diamond growth and decreasing nucleation rates with increasing substrate te… Show more

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Cited by 77 publications
(54 citation statements)
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“…The feature of the distribution is the exponentially decreasing number with increasing size, which is related to the growth mechanism of the NCD film in the surface-wave plasma. 24) Fig. 7.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The feature of the distribution is the exponentially decreasing number with increasing size, which is related to the growth mechanism of the NCD film in the surface-wave plasma. 24) Fig. 7.…”
Section: Resultsmentioning
confidence: 99%
“…[21][22][23][24][25] It has realized a wide substrate temperature range for NCD growth from below 100 C to above 700 C. 24) Employing this technique, NCD films have been deposited on stainless steel substrates without those problems in the present work. Their mechanical properties have been characterized by friction and wear tests.…”
Section: Introductionmentioning
confidence: 99%
“…15 More recently, homogeneous diamond nucleation was reported at low pressure (o10 2 Pa compared to 10 3 -10 4 Pa for conventional CVD) and a low electron temperature (2.6 eV instead of 5 eV) using surface microwave plasma (MPCVD) for diamond growth on plastic substrates at a temperature lower than 100 1C. 16 Transmission electron microscopy (TEM) investigations have demonstrated the presence of nanometric diamond crystals, probably formed in the gas phase ( Figure 10.1). These findings are supported by calculations, which predicted suitable plasma conditions.…”
Section: Diamond Homogeneous Nucleationmentioning
confidence: 99%
“…Using surface wave plasma, nanocrystalline diamond films have been deposited onto plastic substrates at temperature down to 100°C [24]. Films morphology corresponds to nanometric diamond crystals embedded in an amorphous carbon matrix according to X-ray diffraction and TEM observations [25]. This surface wave plasma allows large area deposition up to 300 × 300 mm 2 .…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%