2018
DOI: 10.1109/jphotov.2017.2770164
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Nanocrystalline n-Type Silicon Oxide Front Contacts for Silicon Heterojunction Solar Cells: Photocurrent Enhancement on Planar and Textured Substrates

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Cited by 59 publications
(49 citation statements)
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“…The electrical and optical properties of (n)nc-SiOx:H layers grown by PECVD with variable gas mixtures were discussed in Ref. [5]. Here we implement the optimized (n)nc-SiOx:H material that exhibited a relatively low refractive index, a high FC and electrical conductivity (σ).…”
Section: Resultsmentioning
confidence: 99%
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“…The electrical and optical properties of (n)nc-SiOx:H layers grown by PECVD with variable gas mixtures were discussed in Ref. [5]. Here we implement the optimized (n)nc-SiOx:H material that exhibited a relatively low refractive index, a high FC and electrical conductivity (σ).…”
Section: Resultsmentioning
confidence: 99%
“…In a recent publication we discussed the role of thickness and refractive index of n-type nanocrystalline silicon oxide (nc-SiOx:H) front contacts replacing the a-Si:H n layer on textured and flat SHJ cells [5]. This material, with doped silicon crystallites embedded in an amorphous silicon oxide matrix, had been originally developed for thin film silicon solar cells, such as a-Si:H/µc-Si:H ("micromorph") tandems cells, for example acting as intermediate reflecting layer [6], and, finally, replacing all doped silicon layers.…”
Section: Introductionmentioning
confidence: 99%
“…[10][11][12][13] The material consists of small nanocrystals embedded in the amorphous matrix, 14 giving confirmed anisotropy properties in the growth direction. 15 Furthermore, nc-Si:H alloyed with oxygen (nc-SiO x :H) allows tunable optoelectrical properties, 16,17 with the advantage of simultaneously obtaining higher E g and lower E a, when compared with a-Si:H. This unique feature also enables more flexibility to tailor the selective transport for enhancing solar cells performance. 6 Interestingly, with similar optical transparency, n-type nc-SiO x :H layers exhibit generally higher conductivity than p-type layers.…”
mentioning
confidence: 99%
“…These simulations also show a rather high parasitic absorption (1.25 mA/cm 2 ) in the n-doped FSF layer. From previous works we know that a nc-SiOx layer can be used as FSF, together with an ITO front contact, to reduce the parasitic absorption, improve Jsc and obtain  > 22.6 % [17,18]. However the combination with the ZnO:Al/a-SiO2 AR bilayer is still ongoing work.…”
Section: C) Optical Benefits Of the Different Ar Approachesmentioning
confidence: 99%