Nanostructure Control of Materials 2006
DOI: 10.1533/9781845691189.303
|View full text |Cite
|
Sign up to set email alerts
|

Nanofabrication

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
3
3
1

Relationship

0
7

Authors

Journals

citations
Cited by 9 publications
(2 citation statements)
references
References 50 publications
0
2
0
Order By: Relevance
“…In a vector scan, the image is split into vectors, which contain the features and, instead of scanning the entire wafer, the electron beam moves from feature to feature [ 13 ]. The photomasks consist of a chrome layer deposited on a quartz substrate where the chrome layer is etched to create the pattern, which will be transferred to the photoresist, whilst the quartz substrate allows the electron transmission [ 127 ].…”
Section: Conventional Lithographic Techniquesmentioning
confidence: 99%
“…In a vector scan, the image is split into vectors, which contain the features and, instead of scanning the entire wafer, the electron beam moves from feature to feature [ 13 ]. The photomasks consist of a chrome layer deposited on a quartz substrate where the chrome layer is etched to create the pattern, which will be transferred to the photoresist, whilst the quartz substrate allows the electron transmission [ 127 ].…”
Section: Conventional Lithographic Techniquesmentioning
confidence: 99%
“…On the topic of fabrications, several innovative routes have been developed to meet the requirement to prepare the optical metamaterials [5][6][7]: ultraviolet (UV) or electron beam lithography (EBL) [8,9], focused ion beam (FIB) milling [10], deposition-induced structuring [11], dewetting-induced nanoscale self-formation [12], oblique angle deposition of three-dimensional structures [13], template-assisted etching and deposition [14], and laser direct writing, are examples of these methods [15]. Among them, several advanced nanoscale fabrication techniques such as UV or EBL, and FIB, are either costly or present a low throughput, so that alternative "lithography-free" fabrication approaches are desired to provide, at a larger scale, nanomaterials with a tailored optical response suitable for applications [16].…”
Section: Introductionmentioning
confidence: 99%