Nanogap-Assisted Surface Plasmon Nanolithography

Ueno, Kosei; Takabatake, Satoaki; Nishijima, Yoshiaki; Mizeikis, Vygantas; Yokota, Yukie; Misawa, Hiroaki

doi:10.1021/jz9002923

Cited by 90 publications

(79 citation statements)

References 32 publications

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“…Moreover, LSPR gives rise to an optical antenna effect, which efficiently harvests light and localizes electromagnetic waves at the nanoscale. [15][16][17][18][19] Therefore, it is understood that metallic nanostructures act as photoelectric conversion systems that enable the effective utilization of photons, having a role similar to that of chlorophyll in photosynthesis. [20][21][22][23] Although many photoelectric conversion systems using LSPR have been previously reported, the wavelengths at which photoelectric conversion occurs did not extend beyond 700 nm, [24][25][26][27][28][29][30][31] creating a need to explore photoelectric conversion at infrared wavelengths past 800 nm.…”

Section: Introductionmentioning

confidence: 99%

Plasmon-enhanced photocurrent generation and water oxidation from visible to near-infrared wavelengths

Ueno

Misawa

2013

NPG Asia Mater

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This paper presents recent investigations of plasmon-enhanced photoelectric conversion and water oxidation by visible and nearinfrared light irradiation. Since the discovery of the Honda-Fujishima effect in 1972, significant efforts have been devoted to lengthening the light-energy conversion wavelength. In this context, plasmonic photoelectric conversion has been recently demonstrated at visible-to-near-infrared wavelengths without deteriorating photoelectric conversion by employing titanium dioxide (TiO 2 ) single-crystal photoelectrodes, in which gold nanorods are elaborately arrayed on the surface. A potassium perchlorate aqueous solution was employed as an electrolyte solution without additional electron donors; thus, water molecules provided the electrons. The stoichiometric evolution of oxygen and hydrogen peroxide as a result of the four-or two-electron oxidation of water molecules, respectively, was accomplished with near-infrared light irradiation using the plasmonic optical antenna effect. As there is very little overpotential for water oxidation, these results constitute a significant advancement in this field. In addition, this photoelectric conversion system could potentially be employed in artificial photosynthesis systems that exceed the photosynthetic capabilities of plants by allowing for photoconversion over a wide range of wavelengths.

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Section: Introductionmentioning

confidence: 99%

Plasmon-enhanced photocurrent generation and water oxidation from visible to near-infrared wavelengths

Ueno

Misawa

2013

NPG Asia Mater

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“…In addition, the patterns can also be manipulated by adjusting incident beam angle, polarization direction, and light frequency; this dynamical manipulation method of surface plasmon patterns will have profound potentials in nanolithography, particle manipulation, and other related fields. Moreover, Ueno et al reported another innovative lithography system based on two-photon photochemical reactions induced by plasmonic near-field light and the scattering component of the light in a photoresist film [74,75], and this method is appropriate for fabricating sharpedged nanodot patterns with nanoscale accuracy. 6.5 Superlens Imaging Nanolithography…”

Section: Other Configurations Of Grating Couplingmentioning

confidence: 99%

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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With the developments of the nanoscale science and technology, the demand for fabrication of nanoscale patterns has been significantly increased. Photolithography has still been the most widely used microfabrication technique because of its ease of repetition, effective cost, and suitability for large-area fabrication. The diffraction limit, however, restricts single-exposure resolution to features with periods no smaller than half wavelength of the illuminating sources. To achieve nanometer feature sizes within the regime of diffraction physics, one straightforward method is to reduce the working wavelength by employing light sources of higher photon energy, such as extreme ultraviolet light (EUV), soft X-rays, or atomic wave packet [1][2][3][4]. The main drawbacks, however, are the drastic increase of complexity and cost for instrumentation and processing, including the developments of new sources, photoresist, and the optical components. Several alternative techniques, such as electron beam lithography [5][6][7][8][9], focused ion beam lithography [10][11][12][13][14], dip-pen lithography [15][16][17][18], and nanoimprint lithography [19][20][21][22], can also achieve nanoscale feature sizes; however, these methods require the introduction of a new infrastructure of tools, materials, and processing technologies, which costs huge expenses.Recently, a new photolithographic scheme, which is based on the unique properties of surface evanescent waves [23][24][25][26] or surface plasmon polaritons (SPPs) [27][28][29][30][31][32][33][34][35][36][37] induced at the interface between a metal and a dielectric material, to achieve sub-diffraction-limit nanopatterns was proposed and demonstrated. The wave vector of SPPs can be significantly larger than that of the free-space illuminating light at the same frequency, which results in extraordinary "optical frequency but X-ray wavelength" property. As a result, the resolution of this surface plasmon nanolithography can go far beyond the free-space diffraction limit of the light. Different versions of the implementation of the SPPs-based super-resolution nanolithography have been proposed and conducted both theoretically and experimentally in recent years, which all demonstrate that SPPs-based nanolithography has the potential to satisfy the requirements of high resolution, low cost, and high throughput simultaneously.

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“…Accordingly, the patterns of pits on the positive photoresist film are highly related to the near-field intensity distributions obtained by the photopolymerization of the negative photoresist on the nanogap structured gold substrate described in the previous section. 98 …”

Section: Award Accountsmentioning

confidence: 99%

Fabrication of Nanoengineered Metallic Structures and Their Application to Nonlinear Photochemical Reactions

Ueno

Misawa

2012

Bulletin of the Chemical Society of Japan

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We used metallic nanoparticles exhibiting localized surface plasmon resonance and electromagnetic (EM) field enhancement effects induced by plasmon excitation for the photochemical reaction field; this approach makes it possible to increase the probability of an interaction between photons and the materials. EM field enhancement effects induced by gold nanostructures were elucidated using two-photon-induced photoluminescence from nanogap-spaced gold nanoparticles. The photoluminescence was promoted mainly in the surface regions of the gold nanoblocks adjacent to the nanogaps due to the EM field enhancement effect. To elucidate the near-field intensity distribution of the nanogap gold structures, we investigated the photopolymerization of a commercially available negative photoresist assisted by EM field enhancement in the nanogaps separating the gold nanoblocks. Photopolymerization rates were enhanced by several orders of magnitude in the gold nanoblock structures that contained nanogaps narrower than 10 nm. We propose two surface plasmon-assisted nanolithography techniques based on spatially selective photochemical reactions promoted by the EM field enhancement effect. The first method uses ultimate near-field lithography with a local near-field distribution induced in the nanogaps, and the second technique uses the scattering component of multipole plasmon resonance as an exposure mechanism. These lithographic techniques represent a type of application based on plasmon-enhanced chemical reactions.

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Nanogap-Assisted Surface Plasmon Nanolithography

Cited by 90 publications

References 32 publications

Plasmon-enhanced photocurrent generation and water oxidation from visible to near-infrared wavelengths

Plasmon-enhanced photocurrent generation and water oxidation from visible to near-infrared wavelengths

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Fabrication of Nanoengineered Metallic Structures and Their Application to Nonlinear Photochemical Reactions

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