Nanograss and nanostructure formation on silicon using a modified deep reactive ion etching

Mehran, M.; Mohajerzadeh, S.; Sanaee, Zeinab; Abdi, Yaser

doi:10.1063/1.3428360

Cited by 25 publications

(14 citation statements)

References 17 publications

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“…1 ). We developed this design based on 2 considerations: (1) The effect of contact guidance on epithelial morphogenesis can be minimized when nanospikes are arranged stochastically and isotropically in order to locally restrict cell spreading, migration, and proliferation along the horizontal plane 2 5 6 7 10 ; (2) Intense, dynamic, and reciprocal interactions between cells and topographic patterns can be achieved when the accessibility and flexibility of nanograss are controlled by modifying nanograss density and aspect ratio 11 12 13 14 . First, we assessed the viability of single Calu-3 cells exposed to the nanograss pattern or to a flat topography after culturing the cells for 12 and 24 h ( Fig.…”

Section: Resultsmentioning

confidence: 99%

In Vitro Epithelial Organoid Generation Induced by Substrate Nanotopography

Shen

Hou

Yao

et al. 2015

Sci Rep

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The extracellular matrix (ECM) exhibits tissue-specific topography and composition and plays a crucial role in initiating the biochemical and biomechanical signaling required for organizing cells into distinct tissues during development. How single cells assemble into structures featuring specific shapes in response to external cues is poorly understood. We examined the effect of substrate nanotopography on the morphogenesis of several types of epithelial cells and found that in response to the topography, Calu-3 and MDCK-II cells formed organoids that closely resemble their morphology in vivo. This finding represents the first demonstration that substrate nanotopography, one of the first physical cues detected by cells, can by itself induce epithelial tissue-like organization. Our results provide insights, in terms of a new aspect of ECM topography, into the design of future tissue-engineering systems and the study of mechanosignaling in the epithelium during normal development and tumor progression.

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Section: Resultsmentioning

confidence: 99%

In Vitro Epithelial Organoid Generation Induced by Substrate Nanotopography

Shen

Hou

Yao

et al. 2015

Sci Rep

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“…By adjusting the etching parameters such as plasma power and duration as well as gas mixture, one can arrive at desired grassy or vertical features. More details about this etching process are described elsewhere [32][33][34][35]. Fig.…”

Section: Introductionmentioning

confidence: 99%

High sensitivity nanostructure incorporated interdigital silicon based capacitive accelerometer

Mehran

Mohajerzadeh

2015

Microelectronics Journal

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“…Introduction: Nano-to-microstructures on silicon surfaces can bring about high specific surface areas [1] and low light reflectivity [2][3][4][5][6][7]. Thus, the surface morphology has become an important issue in the fabrication process of many optical, optoelectronic and biochemical devices, such as MEMS (microelectromechanical systems) capacitors [3], solar cells [2,4,5] and infrared sensors [8]. In addition, an appropriate surface morphology is very important when the silicon acts as the feed layer for other materials [9].…”

mentioning

confidence: 99%

Size‐controllable fabrication of nano‐to‐microstructures on silicon surface using high‐density ion etching with pulsed bias

Zhang

Huang

et al. 2014

Micro & Nano Letters

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A 'black silicon' (BS) surface with low reflectance was fabricated by a standard pulsed deep reactive etching technology at room temperature. Aiming for a better understanding, a systematic experiment was conducted by varying the etching window size and bias power duty cycle. The samples were measured and analysed by a scanning electron microscope, the Bruker Optical Profiler and a UV-3400 spectrometer. It was observed that a broad scale range of the surface structures formed on the surface. With the duty cycle at 0.5, only about 100 nanometre scale replicable silicon cones formed on the surface, but as the duty cycle decreased to 0.25, the height of the silicon forest sharply increased to about 10 µm, leading to a low reflectance of 0.9% in the visible range for the surface. To clarify the reason for this trend, the bias effective voltage (BEV) was measured and it was confirmed that the BEV would decrease from 100 to 47 V with the duty cycle adjusted from 1 to 0.25. This suggested that this decrease in BEV leads to a reduction of ion energy and ion flux, and then modifies the fabricated structures. Besides, it was found that the broad etching window area only had a maximum promotion of 20% to the scale of the BS, indicating this method was almost free of loading effect.

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Nanograss and nanostructure formation on silicon using a modified deep reactive ion etching

Cited by 25 publications

References 17 publications

In Vitro Epithelial Organoid Generation Induced by Substrate Nanotopography

In Vitro Epithelial Organoid Generation Induced by Substrate Nanotopography

High sensitivity nanostructure incorporated interdigital silicon based capacitive accelerometer

Size‐controllable fabrication of nano‐to‐microstructures on silicon surface using high‐density ion etching with pulsed bias

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