Nanoimprint lithography using novel optical materials for AR|MR devices

Abstract

With the advent ofnovel optical and photonic devices such as Augmented Reality (AR), and Mixed Reality (MR),there is renewed interest in Nanoimpdnt l"ithography (N1ι) techn010gy as a cost effective approach to manufacture key Performance e血ancing components for these devices, such as surface relief gratings (SRGS) for waveguides. we have developed multゆle types ofresists for use in NIL for mak血g surface ReliefGratings (SRGS) for waveguides for AR & MR devices This paperwi11discussthe N11̲'performance ofourresists such as high re丘'active indeX 6.1nctionalNIL resists, resists for N11"・ Etch process as we11 as resists for Bi・1ayer N11"・Etch approach for pattemi11g high aspect ratio stNctures. Xve wi11 discuss various mate"alpropedies and performa11Ce ofthe N11" resists in NIL process.