Nanoimprint performance improvements for high volume semiconductor device manufacturing

Kobayashi, Kenzo; Torii, Hirotoshi; Hiura, Mitsuru; Takabayashi, Yukio; Kimura, Atsushi; Suzaki, Yoshio; Ito, Tsugutaka; Yamamoto, Kazuhisa; Choi, Jin; Estrada, Teresa

doi:10.1117/12.2640651

Cited by 3 publications

(1 citation statement)

References 5 publications

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“…We employed pattern fabrication and created surface functions on high-fluorine materials by UV nanoimprint lithography, a type of pattern fabrication process. Nanoimprint lithography is a simple, high-precision, high-resolution, and largearea pattern fabrication technique [34] [35] with a wide range of applications in the field of electronics [36], such as semiconductors [37][38] and solar cells [39] [40], and the field of life science [41], such as microneedles [42][43] and cell culture scaffolds [44] [45].…”

Section: Introductionmentioning

confidence: 99%

Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Applications

Yamagishi,

Miura,

Ando

et al. 2023

J. Photopol. Sci. Technol.

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Fluorine materials exhibit excellent properties, such as high water repellency, low adhesion, and chemical resistance, owing to their low surface energy. They also exhibit high thermal and oxidation stability owing to the strength of the C-F bonds. Recently, in the field of life science, further improvement of the low adherence and antifouling properties of biological substances and microorganisms by imparting surface properties to fluorine materials through pattern fabrication technology has attracted considerable attention. However, fluorine materials exhibit high thermal expansion and contraction, making it difficult to apply fabrication methods, such as injection molding and hot embossing. Conventional focused ion beam and laser processing are difficult for further pattern fabrication. Here, an ultraviolet (UV)-curable material with a high fluorine content (44wt%) was created, and the pattern fabrication of 80-nm line structures was performed on the material by UV nanoimprint lithography using the gas-permeable template that can permeate the gas entrained during pressurization. The water contact angle was 127.3°, with 129.7° being the most favorable, achieved by a combination of the water-repellency characteristics of the UV-curable material with high fluorine content and fine line patterning in the nanometer range. We discovered the possibility of creating surface functions on short-chain perfluoroalkyl sulfonate (PFAS) substitutes with a relatively low impact on the environment and human body by establishing a pattern fabrication method for long-chain PFAS, which is more difficult to pattern fabricate, as a preliminary experiment.

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Section: Introductionmentioning

confidence: 99%

Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Applications

Yamagishi,

Miura,

Ando

et al. 2023

J. Photopol. Sci. Technol.

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Lithography mask thermal and stress effect for the machine overlay compensation

Rui,

Zhang,

Shen

et al. 2024

Journal of Vacuum Science &Amp; Technology B

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With the continuous advancement of integrated circuit technology nodes, the degree of chip integration is increasing, and the requirements for critical dimensions and overlay errors are becoming more and more stringent. In recent years, near-field lithography technologies such as nanoimprint lithography and plasmonic lithography have made rapid progress; however, the challenge of compensating for their overlay has yet to be solved or systematic reports are lacking. This work offers an overlay compensation approach based on the theory of overlay and mask stress mechanics and thermodynamics by providing stress to the mask. The overlay analysis model and correction feedback mechanism based on mask compensation technology is carried out theoretically. This work establishes the relationship between the overlay compensation parameters and the mask stress by using strict calculation methods, quantitative characterization, and combining sensitivity analysis methods. Theoretical verification of various overlay distribution patterns demonstrates the efficiency of this feedback compensation strategy as well as the quantitative analytical calculation. It is verified that, under ideal conditions, the feedback technique may minimize the overlay error caused by mask thermal effects to ∼1.5 nm. This research presents a quantitative control mechanism for reducing overlay for near-field lithography, and it has substantial guiding implications for traditional lithography quantitative research on the influence of mask stress or temperature on overlay.

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High temporal resolution measurement of the curing process of nanometer-thick photocurable liquid films using the fiber wobbling method

Itoh

Aratani

Lin

et al. 2023

Appl. Phys. Express

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We established a method for assessing the curing process of a nanometer-thick photocurable liquid film by monitoring changes in shear viscoelasticity at a high temporal resolution. The originally developed nano-rheometry method (the fiber wobbling method) was applied for the viscoelastic measurements. We succeeded in measuring the curing process of a 100-nm thick liquid film with a time resolution of 1 ms. The experimental results suggested that the confinement effect in the nanogap suppresses liquid curing. Thus, the proposed evaluation method can be used as for developing nanoimprint lithography and high-precision 3D printing.

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Nanoimprint performance improvements for high volume semiconductor device manufacturing

Cited by 3 publications

References 5 publications

Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Applications

Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Applications

Lithography mask thermal and stress effect for the machine overlay compensation

High temporal resolution measurement of the curing process of nanometer-thick photocurable liquid films using the fiber wobbling method

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