Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication

Abstract

Abstract:The generated resist based defects on the template in addition to the presence of particles and contaminants is critical for ultraviolet curing of nanoimprint lithographic fabrication. This procedure is proven to be suitable for advanced resist material design under the process conditions. Nanoimprint resist material containing an ultraviolet reactive fluorine surfactant was developed to modify the fundamental surface interactions between resists and the template for defect reduction in nanoimprint patterning replication. The developed acrylate type nanoimprint resist material containing 4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11-heptadecafluoro-2-hydroxyundecyl acrylate as an ultraviolet reactive fluorine surfactant, indicated excellent patterning dimensional accuracy by minimizing surface free energy, and having the effect of improving the generated resist based defect numbers on the template, with a 500 nm contact hole and 2 μm line patterns, in the replication of 20 nanoimprint process cycles. This desirable concept using an ultraviolet reactive fluorine surfactant with an acrylate group in the acrylate type nanoimprint resist material is one of the most promising processes ready to be incorporated into mass fabrication in the next generation of electronic devices.

Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices

“…The excellent water contact angle and surface energy of TPU-Green2014 were determined as approximately 102° and 22.1, respectively. This was because the surface free energy in the nanoimprint materials was related to the rounding of sharp corners due to the surface free energy after the template was released from the surface of the nanoimprint material on the template [27]. Therefore, low surface free energy of approximately 22.1 in TPU-Green2014 was expected to lead to stronger antiadhesion between the TPU-Green2014 and the replica template, in order to avoid various kinds of nanoimprint material pattern peeling, defects, particles, and contaminants.…”

“…In addition, employing UV curing nanoimprint green lithography for the mass production of advanced electronic devices faces challenges because the adhesion force between the nanoimprint material and the surface of the master template must be minimized with fluorinated surfactants and the adhesion force between the nanoimprint material and underlayer materials must be maximized to avoid various kinds of nanoimprint material pattern peeling, defects, particles, and contaminants [17][18][19][20][21]. Figure 1 shows the pattern peeling of nanoimprint material and other defects which present a challenge that must be resolved for UV curing nanoimprint lithography.…”

Special Feature Organo-Fluorine Chemical Science

“…The paper on Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication by Satoshi Takei and Atsushi Sekiguchi [7] describe their development and optimization of using 4.5 wt% of the fluorine surfactant 4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,1-heptadecafluoro-2-hydroxyundecyl acrylate as a template release component in their formulation of nanoimprint resist materials. The fluorine surfactant effectively contributed to providing a clean separation technology for mass-production using UV curing nanoimprint lithography.…”

Ecofriendly antiglare film derived from biomass using ultraviolet curing nanoimprint lithography for high-definition display

“…The surface free energy of TPU-AGF-Green1 was calculated using the reported surface free energy components of water, n-hexadecane, and diiodomethane, together with the experimental contact angles of water, n-hexadecane, and diiodomethane on TPU-AGF-Green1 layer in Owens who extended the Fowkes concept. [16][17][18] The surface free energy of TPU-AGF-Green1 was 43 mJ∕m 2 . The structure of sugarrelated organic compounds derived from biomass contributes to lowering the viscosity, while the photocurable acryloyl groups in TPU-AGF-Green1 provide an acceptable surface free energy in the fundamental evaluation of eco-friendly antiglare film with liquid glucose and trehalose derivatives.…”