Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Takabayashi, Yukio; Hiura, Mitsuru; Morohoshi, Hiroshi; Kodachi, Nobuhiro; Hayashi, Tatsuya; Kimura, Atsushi; Yoshida, Takahiro; Mishima, Kazuhiko; Suzaki, Yoshio; Choi, Jin

doi:10.1117/12.2258385

Cited by 10 publications

(3 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…UV nanoimprint lithography (UV-NIL) has been attracting intense interest because of its potential for fine patterning at the single-digit nanometer scale and atomic-scale low line-edge roughness, in addition to the high throughput and low cost of imprint steppers in the nanofabrication process. − In the semiconductor industry, nanofabrication technology has been progressing according to Moore’s law, predicting a yearly increase in the density of devices, but is considered to face its limitation. The UV-NIL process with fused silica molds (quartz molds) is expected to be a candidate to break the limitation.…”

Section: Introductionmentioning

confidence: 99%

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

et al. 2018

View full text Add to dashboard Cite

In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; however, the 7 nm diameter pillar patterns were not fabricated using hydroxy-containing monomers. The filling behavior into silica holes of around 10 nm depended on the chemical structure of the monomers. Resonance shear measurements revealed the following: (1) The viscosities of hydroxy-containing monomers confined between chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl)-modified surfaces began to increase at distances shorter than those of the monomers between unmodified surfaces. (2) The monomers confined between tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane-modified surfaces were squeezed out when the surface-surface distance decreased at less than 7 nm. The measured viscosities between the FAS3-Cl-modified silica surfaces were correlated with the insufficient filling behavior into the silica holes of around 10 nm in UV nanoimprinting. Contact angle measurements provided an additional insight that a higher wettability of the monomers onto the antisticking chemisorbed monolayers resulted in imprinted patterns with higher aspect ratios. Considering the increase in the monomer viscosity in the nanospace and the wettability of monomers onto chemisorbed monolayers, we concluded that the monomer showing low viscosity under confinement and high wettability onto the mold surface was suitable for single-digit nanometer UV nanoimprinting.

show abstract

Section: Introductionmentioning

confidence: 99%

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

et al. 2018

View full text Add to dashboard Cite

show abstract

“…Efforts are being devoted in this area toward the reduction of defects by improving the control of particles in the air, and the improvement of the throughput of wafers, now on the order of some tens of wafers per hour. Durability of the mold has also been improved through a good management of contaminants reaching 1000 replicas per mold …”

Section: Structuring Techniques For Light‐sensitive Polymersmentioning

confidence: 99%

Light to Shape the Future: From Photolithography to 4D Printing

Barrio

Sánchez‐Somolinos

2019

Advanced Optical Materials

196

147

View full text Add to dashboard Cite

producing increasingly complex patterned films and miniaturized devices, which are required in modern information and communication technologies. [1] In addition to semiconductor device fabrication, a host of applications for patterned thin films and structured polymeric systems have been identified over the last two decades in areas including optics, energy harvesting, biotechnology, and medicine. [2] Our ability to structure polymeric materials has grown tremendously and the palette of materials and techniques to achieve a quick and reliable production of patterns with increasing resolution is quite extensive. This boom has been largely sustained by the development of specific photonic technologies, such as advanced light sources or spatial light modulators, photosensitive materials, and, more importantly, our growing knowledge of the interaction between light and matter. Indeed, the ability to control a chemical reaction with light in a remote fashion is a powerful concept. Light irradiation can initiate a photochemical process that otherwise would not occur at ambient conditions. This property lies at the origin of the temporal control afforded by simply turning the light source on and off. Moreover, patterned illumination or the use of focused light beams enables control of not only when, but also where a photoinduced transformation occurs. The photochemical processes occurring in many polymers and resists can be effectively manipulated by fine-tuning the intensity and frequency of light. However, these are just two of the primary properties of light, and there are specific photoresponsive systems that enable the generation of ordered structures by adjusting the polarization of light, in addition to intensity and frequency.In this review, an overview of photochemical reactions, photosensitive polymers, and light-based structuring techniques is provided. As this field is too broad to be covered in depth in one single article, some recent examples and applications, as well as emerging opportunities and trends, are highlighted throughout the discussion. Section 2 is focused on light-induced reactions and photosensitive materials. The fundamentals of photochemical reactions and their implementation in polymer science have been overviewed in many excellent books and reviews. [3] In Section 2, rather than being comprehensive, emphasis is given to those photochemical processes lying at the basis of those structuring techniques that are later discussed in Section 3. Some of these techniques, including conventional mask lithographies, interference lithographies, direct laser writing (DLW) with one-or two-photon processes, or stereolithographic techniques, make use of light as a structuring tool.There is an additional group of techniques where light is employed to set a structure created beforehand through a Over the last few decades, the demand of polymeric structures with welldefined features of different size, dimension, and functionality has increased from various application areas, including microelectronics, ...

show abstract

“…The resolution of the transferred pattern depends on the pattern of the mold, and the reverse pattern is fabricated on the replication material. There has been recent progress in nanoimprint lithography for high-volume semiconductor manufacturing [9,10]. There are two types of nanoimprint processes for the fabrication of devices.…”

Section: Introductionmentioning

confidence: 99%

Nanoimprint Graphoepitaxy for Molecularly Oriented Nanofabrication

Okada

2017

J. Photopol. Sci. Technol.

View full text Add to dashboard Cite

Nanoimprint graphoepitaxy is a simple way of fabricating molecularly oriented nano/microstructures. This paper describes our studies of the mechanism of the nanoimprintgraphoepitaxy-induced molecular orientation of P6CAM, a photo-cross-linkable liquid crystalline polymer. We describe the dependence of the molecular orientation of P6CAM on the nanoimprint process and the unique molecularly oriented patterns formed by nanoimprint graphoepitaxy.

show abstract

Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Cited by 10 publications

References 4 publications

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

Light to Shape the Future: From Photolithography to 4D Printing

Nanoimprint Graphoepitaxy for Molecularly Oriented Nanofabrication

Contact Info

Product

Resources

About