2011
DOI: 10.1016/j.actamat.2011.06.023
|View full text |Cite
|
Sign up to set email alerts
|

Nanoindentation study of deformation-resistant Al/a-Si core–shell nanostructures

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

3
6
0

Year Published

2014
2014
2020
2020

Publication Types

Select...
5

Relationship

2
3

Authors

Journals

citations
Cited by 15 publications
(9 citation statements)
references
References 24 publications
3
6
0
Order By: Relevance
“…As can be seen, the indenter displacement returns to zero (or nearly to zero) regardless of the applied maximum indenter displacement, which indicates that very little residual deformation remains after indentation. In light of the fact that for the 80 nm indents, the maximum indentation depth is 20% of the total structure height of 400 nm, this deformation resistance is especially notable and is consistent with previously reported measurements on Al/a-Si nanostructures fabricated from a nanotextured Al thin film [15,16].…”
Section: Deformation Resistant Csnssupporting
confidence: 91%
See 2 more Smart Citations
“…As can be seen, the indenter displacement returns to zero (or nearly to zero) regardless of the applied maximum indenter displacement, which indicates that very little residual deformation remains after indentation. In light of the fact that for the 80 nm indents, the maximum indentation depth is 20% of the total structure height of 400 nm, this deformation resistance is especially notable and is consistent with previously reported measurements on Al/a-Si nanostructures fabricated from a nanotextured Al thin film [15,16].…”
Section: Deformation Resistant Csnssupporting
confidence: 91%
“…An electron beam writer (JBX-9300FS, JEOL Ltd.) was used to selectively expose the electron resist using 1 nA of current, a 50 kV accelerating voltage, and a beam dose of 1000 μC/cm 2 . After exposure, the sample was developed in a 1:3 mixture of methyl isobutyl ketone (MIBK) and isopropyl alcohol (IPA) for 45 s, and then rinsed in pure IPA for 15 Fig. 1; note that the specified rod length excludes the hemispherical end-caps of each rod.…”
Section: Nanostructure Fabricationmentioning
confidence: 99%
See 1 more Smart Citation
“…Young's modulus (a), hardness (b), and yield strength (c) of the 0.5 µm SiLi x thin films as a function of Li content in comparison to literature values of a‐S , c‐Si , Li , compacted c‐SiLi x powder , tension simulations by Zhao et al and MD simulations by Fan et al , respectively. Dotted lines were added as a guide for the eye.…”
Section: Resultsmentioning
confidence: 98%
“…When subjected to nanoscratch testing, no plastic deformation of the surface was detected, even for contact loads as high as 8,000 μN, while still maintaining a low coefficient of friction. Nanoindentation experiments on the individual CSNs revealed that the structures possess higher yield strengths than either Al or a-Si, and can also sustain up to 23% engineering strain without fracture [21]. Furthermore, the CSNs display unusual loaddisplacement behavior with no residual deformation, indicating little or no permanent deformation after unloading.…”
Section: Introductionmentioning
confidence: 99%