2004
DOI: 10.1007/1-4020-7757-2_2
|View full text |Cite
|
Sign up to set email alerts
|

Nanolithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

2009
2009
2012
2012

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 38 publications
0
2
0
Order By: Relevance
“…The development of synthetic strategies and analytical tools for controlling structures on the 1−100 nm length scale is fundamental to nanoscience. For planar surfaces, photo- and e-beam lithographic methods are now well established, and a variety of microscopy techniques (e.g., AFM, STM) are readily available to evaluate new structures on the 10 nm length scale. Indeed, the positive feedback loop between the development of lithographic and microscopy techniques has been a major driver for the broader nanoscience field.…”
Section: Introductionmentioning
confidence: 99%
“…The development of synthetic strategies and analytical tools for controlling structures on the 1−100 nm length scale is fundamental to nanoscience. For planar surfaces, photo- and e-beam lithographic methods are now well established, and a variety of microscopy techniques (e.g., AFM, STM) are readily available to evaluate new structures on the 10 nm length scale. Indeed, the positive feedback loop between the development of lithographic and microscopy techniques has been a major driver for the broader nanoscience field.…”
Section: Introductionmentioning
confidence: 99%
“…The large variety of chemical functionalities that can be incorporated using each of these techniques, and the ease with which nanografting can produce features with different shapes, should enable the technique to produce films with a variety of different structures. As with other serial nanolithography approaches, such as electronbeam lithography and scanning tunneling lithography [23], the main drawback of the technique is the time required to draw the patterns on the surface. However, the development of cantilever array techniques will greatly enhance the speed of AFM lithography.…”
mentioning
confidence: 99%