Nanolithography based on an atom pinhole camera

Melentiev, Pavel N.; Zablotskiy, A. V.; Lapshin, D. A.; Sheshin, E.P.; Baturin, A. S.; Balykin, V. I.

doi:10.1088/0957-4484/20/23/235301

Cited by 24 publications

(16 citation statements)

References 23 publications

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“…A more advanced technique would be to use the metastable beam for lithography or direct deposition. This has been successfully demonstrated in pinhole imaging [23,21].…”

Section: Detectionmentioning

confidence: 89%

“…Pinhole lenses were behind the first "camera obscura" photographs, and they are similarly effective in the atomic realm [21,22,23]. Classically, a pinhole image is modeled by simply tracing rays through an infinitesimal aperture, yielding a focused image at any distance.…”

Section: Passive Lensesmentioning

confidence: 99%

“…This method has been used quite successfully, for example to deposit indium atoms on a silicon substrate with 30 nm resolution (Figure 1.2) [23]. The demagnification factor for pinhole lenses is excellent, reaching easily into the thousands.…”

Section: Passive Lensesmentioning

confidence: 99%

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Neutral Atom Imaging Using a Pulsed Electromagnetic Lens

Gardner¹

2018

Springer Theses

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To Robin, who taught me empathy and discipline; to my parents, who taught me integrity and who made my world a safe place;and to Olive the dog, who did the opposite. AcknowledgementsI must first thank Mark Raizen, whose steady leadership and generous support guided this project through many obstacles. Several problems we encountered, like those with the supersonic valve, seemed preternaturally resistant to logical analysis. Others felt like fundamental flaws in the experimental design. At some points over the past five years, I am reasonably sure that Mark was the only person in the world who believed that our lens would produce images even a fraction as good as those which fill these pages. He has an uncanny ability to see to the core of a problem, and there were many humbling occasions on which this talent quickly outweighed several days' worth of dedicated troubleshooting. More important than offering fast solutions, Mark is always ready to sit down and think through a problem. When the path forward seems irredeemably blocked, meeting with Mark reliably helps to clarify the issue, outline a plan of attack, and lift our spirits. In addition to his scientific leadership, Mark's kindness and compassion set him apart. I have never felt pressured to prioritize this project over my personal well-being, and Mark has demonstrated countless times that his primary goal is not publications or grants but the success of his students. Erik Anciaux joined the project at the end of my second year, and it would be difficult to overstate my debt to him as both a colleague and a friend. Through long periods of slow, discouraging progress, Erik's work ethic remained relentlessly focused. His attitude was buoyant enough to float my own, even when we were both convinced that the entire project was falling apart. Erik has a remarkable capacity to say: "nothing works, and we are very likely moving in the wrong direction; let's get to it." This ability to put one foot in front of the other-even when everything is broken-is something I admire and continuously try to emulate. Lest it be supposed that Erik's work ethic balances an unremarkable natural talent, I should also mention that he is an extremely gifted physicist. Erik's mastery of theoretical concepts and his knack for the minutiae of experimental atom optics make him uniquely qualified to tackle the many puzzles we face. He is personally responsible for breakthroughs like developing the Vespel-Swagelok connection and discovering the source of the double-peak phenomenon, among others. It is not the least bit hyperbolic to say that without Erik this project would not have succeeded. In addition to his scientific v contributions, I am indebted to Erik for his friendship, which made the lab a fun place to work. Our prototype lens was assembled in the chaos of high-volume political debates, often shouted over both the hum of the chopper (D-sharp, I believe) and a classic rock Pandora station (only on Fridays). It is a testament to our friendship that working together in an often-st...

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“…A more advanced technique would be to use the metastable beam for lithography or direct deposition. This has been successfully demonstrated in pinhole imaging [23,21].…”

Section: Detectionmentioning

confidence: 89%

Section: Passive Lensesmentioning

confidence: 99%

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Neutral Atom Imaging Using a Pulsed Electromagnetic Lens

Gardner¹

2018

Springer Theses

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“…[1][2][3] Pinhole lenses have been used to deposit indium atoms on a silicon substrate with 30 nm resolution. Unfortunately, a pinhole lens capable of 30 nm resolution must itself be around 20 nm wide, severely limiting atom flux.…”

Section: Introductionmentioning

confidence: 99%

Communication: Neutral atom imaging using a pulsed electromagnetic lens

Gardner

Anciaux

Raizen

2017

The Journal of Chemical Physics

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We report on progress towards a neutral atom imaging device that will be used for chemically sensitive surface microscopy and nanofabrication. Our novel technique for improving refractive power and correcting chromatic aberration in atom lenses is based on a fundamental paradigm shift from continuous-beam focusing to a pulsed, three-dimensional approach. Simulations of this system suggest that it will pave the way toward the long-sought goal of true atom imaging on the nanoscale. Using a prototype lens with a supersonic beam of metastable neon, we have imaged complex patterns with lower distortion and higher resolution than has been shown in any previous experiment. Comparison with simulations corroborates the underlying theory and encourages further refinement of the process. Published by AIP Publishing. [http://dx

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“…A method of mitigating this effect was proposed [19] and demonstrated [20], but is challenging to implement in practice. Alternative approaches, such as focusing of atoms using macroscopic magnetic lenses [21] or an "atom pinhole camera" [22] have also been explored. All the above techniques have used effusive beams, limiting atomic density to around 10 10 atoms/cm 3 , and have achieved controlled feature sizes (at best) on the order of 100 nm.…”

mentioning

confidence: 99%

Nanofabrication by magnetic focusing of supersonic beams

et al. 2010

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We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin magnetic film, into which apertures with widths on the order of 100 nm have been etched. Focused spot sizes near or below 10 nm, with focal lengths on the order of 10 µm, are predicted. This scheme is applicable both to precision patterning of surfaces with metastable atomic beams and to direct deposition of material.Nanoscale fabrication is a critical tool for realizing much of modern technology, including information processing, biomedical research, and photonics [1][2][3]. Optical lithography, the current method for chip mass production, is used to produce many features in parallel, but has a limited resolution due to the wavelength of light used. Electron beam (e-beam) lithography, a method for producing much smaller (order of 1 nm) features, is a serial, rather than parallel, method, meaning that it is much more time-consuming than optical lithography. Ebeam, however, is frequently used to fabricate the masks that are required by the latter. Additional methods, using vacuum ultraviolet or X-ray radiation [4], or using focused ion beams [5], are being developed in an effort to achieve high-resolution and high-throughput nanofabrication.One area of great potential for nanofabrication is atom lithography [6,7]. The deBroglie wavelength of atoms is typically much less than an optical wavelength, potentially resulting in a much smaller diffraction-limited spot size. Additionally, fabrication operations are parallelizable; much work has focused on depositing multiple lines and dots of atoms by focusing from a standing light wave [8][9][10][11][12]. In addition, atom lithography is versatile in the sense that one may either directly write structures onto a substrate [13][14][15][16][17], or may pattern a resist prior to etching, as in traditional lithography, using a beam of metastable atoms [18]. The primary limitation of optical focusing is that it is difficult to focus some of the atoms without simultaneously defocusing others, leading to significant aberrations and an unwanted underlayer of material. A method of mitigating this effect was proposed [19] and demonstrated [20], but is challenging to implement in practice. Alternative approaches, such as focusing of atoms using macroscopic magnetic lenses [21] or an "atom pinhole camera" [22] have also been explored. All the above techniques have used effusive beams, limiting atomic density to around 10 10 atoms/cm 3 , and have achieved controlled feature sizes (at best) on the order of 100 nm.In this Letter, we propose a new approach to atom lithography that should enable much smaller feature sizes and larger throughput. Our method consists of magnetic focusing of a supersonic beam through a nanofabricated magnetic mask. As nearly all atoms are paramagnetic in either the ground state or an accessible metastable state, magnetic foc...

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Nanolithography based on an atom pinhole camera

Cited by 24 publications

References 23 publications

Neutral Atom Imaging Using a Pulsed Electromagnetic Lens

Neutral Atom Imaging Using a Pulsed Electromagnetic Lens

Communication: Neutral atom imaging using a pulsed electromagnetic lens

Nanofabrication by magnetic focusing of supersonic beams

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