Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves

Kostovski, Gorgi; Mitchell, Arnan; Holland, Anthony S.; Fardin, E.A.; Austin, Michael W.

doi:10.1063/1.2190899

Cited by 7 publications

(8 citation statements)

References 7 publications

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“…For this purpose, the fact was used that wavy substructure features inside the cross section of a single polymerized line arise during a polymerization process in a thin polymer film [40,41]. The reason for this can be explained by interference between the focused laser and the back reflection at the boundary layer of the photosensitive material [38,39]. Thus, the biomimetic systems consist of hierarchically micro-and nanostructure which form a multlayer system (see Figs.…”

Section: Resultsmentioning

confidence: 99%

“…Nevertheless, hierarchical microstructure systems can be generated by 2PP using a thin-film of the base material for the polymerization process. In this case, a wavy substructure feature arises inside the cross section of a single polymerized line by the interference between the focused laser and the back reflection at the boundary layer [38][39][40][41]. The size of the wavy substructures depends on the adjusted laser intensity.…”

Section: Fabrication Procedures and Design Of Biomimetic System With Pmentioning

confidence: 99%

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Biomimetic structural coloration with tunable degree of angle-independence generated by two-photon polymerization

Zyla¹,

Kovalev²,

Heisterkamp³

et al. 2019

Opt. Mater. Express

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A successful realization of photonic systems with characteristics of the Morpho butterfly coloration is reported using two-photon polymerization. Submicron structure features have been fabricated through the interference of the incident beam and the reflected beam in a thin polymer film. Furthermore, the influence of the lateral microstructure organization on the color formation has been studied in detail. The design of the polymerized structures was validated by scanning electron microscopy. The optical properties were analyzed using an angleresolved spectrometer. Tunable angle-independence, based on reflection intensity modulation, has been investigated by using photonic structures with less degree of symmetry. Finally, these findings were used to demonstrate the high potential of two-photon polymerization in the field of biomimetic research and for technical application, e.g. for sensing and anti-counterfeiting.

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Section: Resultsmentioning

confidence: 99%

Section: Fabrication Procedures and Design Of Biomimetic System With Pmentioning

confidence: 99%

Biomimetic structural coloration with tunable degree of angle-independence generated by two-photon polymerization

Zyla¹,

Kovalev²,

Heisterkamp³

et al. 2019

Opt. Mater. Express

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“…This slight discrepancy between the model and experiment likely arises as a result of several contributing factors. First, we note the non‐perfect geometry of the actual mask's cross‐section relative to that of the ideal isosceles triangle geometry used to model the system (because of the means of fabrication used, the former is rougher and slightly asymmetric) 55. The largest contribution to the broadened intensity likely results from a slight compression of the tips of the triangular mask upon contact the hard, photoresist‐coated, substrate 56…”

Section: Resultsmentioning

confidence: 99%

Triangular Elastomeric Stamps for Optical Applications: Near‐Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Bowen

Motala

Lucas

et al. 2012

Adv Funct Materials

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applications. Some notable examples of techniques motivated by topics attracting signifi cant attention in current research include nanoimprint lithography, [ 1 , 2 ] nanosphere lithography, [ 3 , 4 ] scanning probe lithography techniques, [ 5 , 6 ] and advanced forms of soft lithography, [7][8][9][10] including interference lithography with elastomeric contact masks. [11][12][13] Additionally, the realization of structures with triangular crosssections, such as cones and prisms, would enable applications in microfl uidic lab-ona-chip devices, [ 14 , 15 ] optical components, antirefl ective coatings, [ 16 , 17 ] self-cleaning surfaces with tuned contact angles, [18][19][20] surface enhanced Raman spectroscopy (SERS) sensing, [ 21 , 22 ] and probe-based patterning techniques. [ 23 , 24 ] A number of useful fabrication techniques have been developed to achieve this geometrical attribute, most commonly relying on etching to defi ne the patterns. The most commonly used method uses KOH-based anisotropic wet etching of Si(100) patterned with photoresist lines, to etch along the < 110 > direction and thus form an array of linear pits with isosceles triangle shaped cross-sections. [25][26][27][28] The feature pitch is dictated by the precision of the alignment of the photoresist features The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifi cally triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-fi eld phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity fi eld nanopatterning, embossing thin-fi lm antirefl ection coatings for improved device performance, and effi cient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. The applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light-matter interactions in a predictable and controllable manner.

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“…Some difficulty is encountered in using elastomeric phase masks as a result of their mechanically compliant nature. Smooth vertical walls are required for the modulations of the intensity to decrease to zero at the phase edge [422]. Distortions in the mask, therefore, will broaden the features developed in the photoresist above theoretical limits.…”

Section: Near-field Edge Lithographymentioning

confidence: 99%

Unconventional methods for forming nanopatterns

Stewart

Motala

Yao

et al. 2006

Proceedings of the Institution of Mechanical Engineers, Part N:

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Nanostructured materials have become an increasingly important theme in research, in no small part due to the potential impacts this science holds for applications in technology, including such notable areas as sensors, medicine, and high-performance integrated circuits. Conventional methods, such as the top-down approaches of projection lithography and scanning beam lithography, have been the primary means for patterning materials at the nanoscale. This article provides an overview of unconventional methods -both top-down and bottom-up approaches -for generating nanoscale patterns in a variety of materials, including methods that can be applied to fragile molecular systems that are difficult to pattern using conventional lithographic techniques. The promise, recent progress, advantages, limitations, and challenges to future development associated with each of these unconventional lithographic techniques will be discussed with consideration given to their potential for use in large-scale manufacturing.

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Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves

Cited by 7 publications

References 7 publications

Biomimetic structural coloration with tunable degree of angle-independence generated by two-photon polymerization

Biomimetic structural coloration with tunable degree of angle-independence generated by two-photon polymerization

Triangular Elastomeric Stamps for Optical Applications: Near‐Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Unconventional methods for forming nanopatterns

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