Nanomechanical properties of ion induced Si ripple patterns

Bhattacharjee, Subhro; Lavanyakumar, D.; Naik, Vaishali; Mondal, Shyamal; Bhattacharyya, S. R.; Karmakar, Prasanta

doi:10.1016/j.tsf.2017.10.053

Cited by 8 publications

(3 citation statements)

References 28 publications

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“…Since the ripple formation is the consequence of instability generation, the combined effect of differential sputtering by the projectile ions and unequal sputtering of silicon from its pure and compounds causes ripple formation. This was also observed earlier by reactive ions [14,15,37,38].…”

Section: Resultssupporting

confidence: 85%

Spatially varying chemical phase formation on silicon nano ripple by low energy mixed ions bombardment

Mukherjee¹,

Bhowmik²,

Bhattacharjee³

et al. 2022

J. Phys.: Condens. Matter

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We report mixed (CO+ and N2+) ion beam induced spatially varying chemical phases formation on Si (100) surface in nanometer length scale. Simultaneous bombardment of carbon, oxygen and nitrogen like three reactive ions leads to well-defined ripple development and spatially varying periodic chemical phases formation. Post bombardment chemical changes of Si surface are investigated by X-ray Photoelectron Spectroscopy (XPS), and spatially resolved periodic variation of chemical phases are confirmed by Electron Energy Loss Spectroscopy (EELS). The thickness of ion modified amorphous layer, estimated by Monte Carlo Simulation (SRIM), is in excellent agreement with the cross-sectional Transmission Electron Microscopy measurements. The formation of such periodic nanoscale ripple having multiple chemical phases at different parts is explained in terms of chemical instability, local ion flux variation and difference in sputtering yield. Potential applications of such newly developed nano material are also addressed.

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Section: Resultssupporting

confidence: 85%

Spatially varying chemical phase formation on silicon nano ripple by low energy mixed ions bombardment

Mukherjee¹,

Bhowmik²,

Bhattacharjee³

et al. 2022

J. Phys.: Condens. Matter

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“…We have already observed Si 3 N 4 formation in the N 1s spectrum (Figure ). Si 3 N 4 is generally formed by N + ion implantation on the Si surface . The binding energies of all Si compounds present in mica are given in Table along with previously reported data.…”

Section: Resultsmentioning

confidence: 94%

Tailoring and investigation of surface chemical nature of virgin and ion beam modified muscovite mica

Bhowmik

Karmakar

2019

Surface & Interface Analysis

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We report that the surface chemical properties of muscovite mica [KAl 2 (Si 3 Al) O 10 (OH) 2 ] like important multi-elemental layered substrate can be precisely tailored by ion bombardment. The detailed X-ray photoelectron spectroscopic studies of a freshly cleaved as well as 12-keV Ar + and N + ion bombarded muscovite mica surfaces show immense changes of the surface composition due to preferential sputtering of different elements and the chemical reaction of implanted ions with the surface.We observe that the K atoms on the upper layer of mica surface are sputtered most during the N + or Ar + ions sputtering, and the negative aluminosilicate layer is exposed. Inactive Ar atoms are trapped, whereas chemically reactive N atoms form silicon nitride (Si 3 N 4 ) and aluminum nitride (AlN) during implantation. On exposure to air after ion bombardment, the mica surface becomes more active to adsorb C than the virgin surface. The adsorbed C reacts with Si in the aluminosilicate layer and forms silicon carbide (SiC) for both Ar and N bombarded mica surfaces. Besides the surface chemical change, prolonged ion bombardment develops a periodic ripple like regular pattern on the surface.

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“…At present, there are no extensive reports on metal impurity assisted ion beam induced nanostructures in domestic and foreign scientific institutes and universities. The previous investigations on the preparation of nanostructures have mainly focused on semiconductor materials [12][13][14][15][16][17][18][19], and few studies have been conducted on optical materials [20]. Moreover, the internal physical mechanism has not yet been elucidated, limiting the application and development of this technology in nanofabrication.…”

Section: Introductionmentioning

confidence: 99%

Nanostructures on Sapphire Surfaces Induced by Metal Impurity Assisted Ion Beam

Chen

Liu

et al. 2020

Coatings

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The metal impurity assisted ion beam technology has shown its uniqueness and effectiveness in the formation and precise control of nanostructures on the surface of materials. Hence, the investigation in this area is vital. The morphology evolution of self-organized nanostructures induced by Fe co-deposition assisted Ar+ ion beam sputtering at a different distance from the impurity target was investigated on sapphire, using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). We also investigated the role of metal impurities on sapphire ripple formation. Experiments were carried out at an oblique angle of incidence 65°with constant ion beam current density 487 μA/cm2 and the erosion duration of 60 min at room temperature (20 °C). The introduction of Fe impurity increased the longitudinal height and roughness of the surface nanostructures. Moreover, the amounts of Fe deposited on the surface decreased with increasing distance, and the morphology of the smooth sapphire surface demonstrated a strong distance dependence. Differences in surface morphology were attributed to changes in metal impurity concentration. With an increase of impurity target distance, island-like structures gradually evolved into continuous ripples. At the same time, the orderliness of nanostructures was enhanced, the longitudinal height gradually decreased, while the spatial frequency was unchanged. In addition, there were very few metal impurities on the etched sample. During the ion beam sputtering process, island-like structures promoted the growth of ripples but destroyed their orderliness.

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Nanomechanical properties of ion induced Si ripple patterns

Cited by 8 publications

References 28 publications

Spatially varying chemical phase formation on silicon nano ripple by low energy mixed ions bombardment

Spatially varying chemical phase formation on silicon nano ripple by low energy mixed ions bombardment

Tailoring and investigation of surface chemical nature of virgin and ion beam modified muscovite mica

Nanostructures on Sapphire Surfaces Induced by Metal Impurity Assisted Ion Beam

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