Nanometer Patterning with Ice

King, Gavin M.; Schürmann, G.; Branton, Daniel; Golovchenko, Jene Andrew

doi:10.1021/nl050405n

Cited by 53 publications

(69 citation statements)

References 20 publications

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“…Figure 4(c) shows an image intensity profile of a 50 nm wide section perpendicular to the metal lines. These new results are a significant improvement over the 17 nm lines we reported earlier 1 and generally superior to lift-off masks using PMMA. The area doses required to remove an 80 nm layer of ice at 5, 15, and 30 kV are, respectively, 0.5, 0.9, and 1.0 C/cm 2 as in our previous study.…”

Section: B Metal Deposition Chambersupporting

confidence: 51%

“…The 3 nm resolution at 5 nA of beam current is important for ice lithography since the number of electrons required to remove a 100-nm-thick ice layer, also called the clearance dose, is about 10 3 -10 4 times the clearance dose needed for a standard PMMA resist. 1 Thus, cold cathode field emission systems with smaller beam currents are poorly suited for ice lithography. To condense volatile gases and improve the SEM chamber vacuum pressure and cleanliness, a liquid nitrogen (LN 2 ) cooled baffle (JEOL pn: SN-73110) was mounted above the diffusion pump.…”

Section: A Semmentioning

confidence: 99%

“…1,2 Although e-beam lithography using organic resists, such as poly(methylmethacrylate) (PMMA) serves as the backbone tool of many nanoscience laboratories, the process requires several time consuming steps carried out in different machines. More importantly, as demonstrated by electron transport studies of very clean as-grown single walled carbon nanotubes, 3,4 optimal device performance is frequently hampered by lift-off residues that contaminate the active nanoscale components.…”

Section: Introductionmentioning

confidence: 99%

“…1 But we encountered many difficulties inherent in the design of such commercially available cryogenic SEM systems which were developed primarily for biological applications (e.g., Quorum Tech., East Sussex, UK, and Gatan Inc., Pleasanton, CA, USA). Here, we report the design and implementation of an instrument dedicated to ice lithography.…”

Section: Introductionmentioning

confidence: 99%

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An ice lithography instrument

Chervinsky

Branton

Golovchenko

2011

Review of Scientific Instruments

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We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.

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Section: B Metal Deposition Chambersupporting

confidence: 51%

Section: A Semmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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An ice lithography instrument

Chervinsky

Branton

Golovchenko

2011

Review of Scientific Instruments

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“…This can be accomplished without device damage or contamination by ice lithography 28 before the ALD procedure.…”

Section: Discussionmentioning

confidence: 99%

Embedding a carbon nanotube across the diameter of a solid state nanopore

Sadki

Garaj

Vlassarev

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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A fabrication method for positioning and embedding a single-walled carbon nanotube (SWNT) across the diameter of a solid state nanopore is presented. Chemical vapor deposition (CVD) is used to grow SWNTs over arrays of focused ion beam (FIB) milled pores in a thin silicon nitride membrane. This typically yields at least one pore whose diameter is centrally crossed by a SWNT. The final diameter of the FIB pore is adjusted to create a nanopore of any desired diameter by atomic layer deposition (ALD), simultaneously embedding and insulating the SWNT everywhere but in the region that crosses the diameter of the final nanopore, where it remains pristine and bare. This nanotube-articulated nanopore is an important step towards the realization of a new type of detector for biomolecule sensing and electronic characterization, including DNA sequencing.2

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CO₂‐Based Dual‐Tone Resists for Electron Beam Lithography

Luo

Wang

et al. 2020

Adv Funct Materials

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The increasing global environmental and energy crisis has urgently motivated the advancement of sustainable materials. Significant effort has been focused on developing new materials to replace the fossil‐based resists in the semiconductor industry based on greener sources such as ice, dry ice, small organic molecules, and proteins. Such resist materials, however, have yet to meet the stringent requirements of high sensitivity, high resolution, reliable repeatability, and good compatibility with the current protocols. To this end, CO2‐based polycarbonates (CO2‐PCs) obtained from the copolymerization of CO2 and epoxides are demonstrated as sustainable dual‐tone (positive & negative tone) resists for electron beam lithography. By adjusting the chemical structure, developing agent, and molecular weight, the CO2‐PCs present high sensitivities to electron beam (1.3/120 µC cm−2), narrow critical dimensions (29/58 nm), and moderate line edge roughness (4.6/26.7 nm) for negative and positive resists, respectively. A deep understanding of the exposure mechanism of CO2‐PC resists is provided on the basis of the Fourier transform infrared, Raman, and electron ionization mass spectroscopy. 2D photonic crystal devices are fabricated using the negative and positive CO2‐PC resists, respectively, and both devices show distinct colors derived from their well‐defined nanostructures, indicating the great practical potential of CO2‐derived electron beam resists.

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Nanometer Patterning with Ice

Cited by 53 publications

References 20 publications

An ice lithography instrument

An ice lithography instrument

Embedding a carbon nanotube across the diameter of a solid state nanopore

CO₂‐Based Dual‐Tone Resists for Electron Beam Lithography

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Nanometer Patterning with Ice

Cited by 53 publications

References 20 publications

An ice lithography instrument

An ice lithography instrument

Embedding a carbon nanotube across the diameter of a solid state nanopore

CO2‐Based Dual‐Tone Resists for Electron Beam Lithography

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Product

Resources

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CO₂‐Based Dual‐Tone Resists for Electron Beam Lithography