Nanometer scale patterning and pattern transfer on amorphous Si, crystalline Si, and SiO2 surfaces using self-assembled monolayers

Wang, Dawen; Thomas, S.G.; Wang, Kang L.; Xia, Younan; Whitesides, George M.

doi:10.1063/1.118625

Cited by 90 publications

(60 citation statements)

References 12 publications

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“…1 Recent developments, such as dip-pen nanolithography (DPN) 2 and microcontact printing (µ-CP), 1 employ a liquid-phase "ink" to pattern a solid "paper" substrate. Established inks for DPN and µ-CP include thiols, 2 DNA, 3 polymers, 4 proteins, 5,6 hexamethyldisilazane, 7 alkylsiloxanes, 8 palladium colloids, 9 sols (Al, Si, Sn oxides), 10 metal complexes, 11 and gold. 12 In this paper, we demonstrate that Au, Pd, and Pt nanoparticle films, produced through a spontaneous electroless deposition reaction, are amenable to patterning via photolithography, µ-CP, and DPN.…”

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confidence: 99%

Electroless Nanoparticle Film Deposition Compatible with Photolithography, Microcontact Printing, and Dip-Pen Nanolithography Patterning Technologies

et al. 2002

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Nanoparticles of Au, Pd, and Pt form spontaneously as thin, morphologically complex metallic films upon various semiconducting or metal substrates such as Ge(100), Cu, Zn, and Sn, via galvanic displacement from aqueous metal salt solutions. Patterning of these high surface area metal films into ordered structures utilizing photolithography, microcontact printing (µ-CP), and dip-pen nanolithography (DPN) is demonstrated on flat Ge(100), and (for µ-CP) on rough Zn foil.There is presently enormous interest in patterning surfaces with micro-and nanometer resolution for both fundamental investigations and technological applications.1 Recent developments, such as dip-pen nanolithography (DPN) 2 and microcontact printing (µ-CP), 1 employ a liquid-phase "ink" to pattern a solid "paper" substrate. Established inks for DPN and µ-CP include thiols, 2 DNA, 3 polymers, 4 proteins, 5,6 hexamethyldisilazane, 7 alkylsiloxanes, 8 palladium colloids, 9 sols (Al, Si, Sn oxides), 10 metal complexes, 11 and gold. 12 In this paper, we demonstrate that Au, Pd, and Pt nanoparticle films, produced through a spontaneous electroless deposition reaction, are amenable to patterning via photolithography, µ-CP, and DPN. Because many properties of the Au, Pd, and Pt nanoparticle films, including film thickness, particle size, and roughness, can be controlled, 13 Figure 1. Deposition proceeds via galvanic displacement 20 in the absence of fluoride, pH buffers, complexing agents, or external reducing agents, in contrast to earlier work. 21-30 Patterning of these particle film assemblies is essential for their subsequent incorporation into higher order architectures and devices. 31,32 The first patterning motif tested, photolithography, was carried out as outlined in Figure 2a. Approximately 0.1 mL of neat dodecene was applied to a 1 cm 2 hydride-terminated Ge(100) surface, which was subequently exposed to 254 nm UV light (9 mW cm -2 intensity) through a metal grid contact mask under an inert atmosphere. 33 The illuminated regions undergo hydrogermylation at room temperature within thirty minutes. A related functionalization approach has been shown on silicon.34 This leads to spatially defined 5-25 µm-sized domains of dodecyl and hydride. Immersion of the hydride/alkyl surface into aqueous noble metal salt solutions results in preferential deposition in the hydride areas since the alkyl monolayer functions as an effective dielectric barrier (Figure 3). The hydride surface oxidizes in-situ and subsequently dissolves in the aqueous medium. Metal salt reduction and deposition can then occur, leading to metallization between the alkylated domains. In this case, the germanium oxide dissolves in water, 35 leading to intimate electrical contact between the semiconductor bulk and the metal salts and affording a faster rate of deposition. In the case of silicon, however, this approach is not feasible because the native oxide has been shown to effectively prevent metal deposition due to its insolubility in water. 20 Attempts to use spatially define...

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Electroless Nanoparticle Film Deposition Compatible with Photolithography, Microcontact Printing, and Dip-Pen Nanolithography Patterning Technologies

et al. 2002

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“…Both SAMs have interesting etch resistance properties. SAMs made of alkyl thiols have shown good protecting ability during wet chemical etches of gold [61][62][63]. Alkylsiloxane SAMs are poorly resistant to HF aqueous solutions, but in very diluted solution they could be used as an etch resistant [64].…”

Section: General Considerations On Samsmentioning

confidence: 99%

Surface treatment and characterization: Perspectives to electrophoresis and lab‐on‐chips

et al. 2006

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The control and modification of surface state is a major challenge in bioanalytical sciences, and in particular in electrokinetic separation methods, due to the importance of electroosmosis. This topic has gained recently a renewed interest, associated with the development of "lab-on-chips" systems that extend the range of materials in which separation channels are fabricated. The surface science community has developed through the years a large toolbox of characterization tools and surface modification protocols, which is not yet fully exploited in the bioanalytical world. In this paper, we try and present an overview of these tools, in order to stimulate new ideas for improved and more controlled surface treatment strategies for separations in capillaries and microchannels. We briefly describe some physical and chemical aspects of electroosmosis (global and spatially resolved), streaming current, and streaming potential. We also review the main strategies for surface coating, and compare the advantages of physisorption, well-organized thin self-assembled monolayers, or conversely thick polymer "brushes". Examples of existing applications to electrophoresis in microchannel are also given.

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“…Therefore, it is difficult to assemble particle on large area. Contact printing technique has been applied for various patterning (15)(16)(17)(18)(19)(20)(21) . This process is effective especially in the case of large scale patterning because the patterning can be carried out in parallel over the mold size.…”

Section: Introductionmentioning

confidence: 99%

Self-Assembly of Fine Particles on Patterned Wettability in Dip Coating and Its Scale Extension with Contact Printing

Kanamori

Kaneko

Moronuki

et al. 2008

JAMDSM

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This study demonstrates the application of dip coating to self-assembly of fine particles on a substrate that is covered with line-and-space pattern of hydrophilic (SiO 2 ) and hydrophobic materials (OTS). The pattern was fabricated on a substrate by lithography first. The substrates were drawn up from the water-based suspension in which particles were dispersed and the particles self-assembled on the hydrophilic region only forming the packed-structure. Then, contact printing was applied for the patterning to extend the scale. The scale was extended up to 10mm x 10mm while keeping the self-assemble performance.

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Nanometer scale patterning and pattern transfer on amorphous Si, crystalline Si, and SiO2 surfaces using self-assembled monolayers

Cited by 90 publications

References 12 publications

Electroless Nanoparticle Film Deposition Compatible with Photolithography, Microcontact Printing, and Dip-Pen Nanolithography Patterning Technologies

Electroless Nanoparticle Film Deposition Compatible with Photolithography, Microcontact Printing, and Dip-Pen Nanolithography Patterning Technologies

Surface treatment and characterization: Perspectives to electrophoresis and lab‐on‐chips

Self-Assembly of Fine Particles on Patterned Wettability in Dip Coating and Its Scale Extension with Contact Printing

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