2020
DOI: 10.1021/acs.jpcc.9b12054
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Nanoparticle-Enhanced Plasma Discharge Using Nanosecond High-Voltage Pulses

Abstract: By discharging nanosecond high-voltage (5 kV) pulses across an insulating substrate containing Au, Pt, or Cu nanoparticles, a 3 order of magnitude (1000×) enhancement in the generation of plasma can be achieved through local field enhancement on the surface of the nanoparticles. The lowtemperature nature of this transient plasma is crucial to maintaining the structural integrity of these delicate nanoparticles. These nanoparticles provide up to a 1000-fold enhancement in the generation of the plasma, which is … Show more

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Cited by 8 publications
(14 citation statements)
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“…Below 9 kV, we only observe plasma emission with Au nanoparticles, indicating that enhancement factors much higher than this are created by the local field enhancement of the nanoparticles. In a previous study carried out in argon, enhancement factors of more than 1000-fold were observed with the presence of the nanoparticles . Above 9 kV, the plasma emission is larger for the electrodes without nanoparticles, where the applied field is strong enough to initiate a plasma from the bulk electrodes.…”
Section: Resultsmentioning
confidence: 87%
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“…Below 9 kV, we only observe plasma emission with Au nanoparticles, indicating that enhancement factors much higher than this are created by the local field enhancement of the nanoparticles. In a previous study carried out in argon, enhancement factors of more than 1000-fold were observed with the presence of the nanoparticles . Above 9 kV, the plasma emission is larger for the electrodes without nanoparticles, where the applied field is strong enough to initiate a plasma from the bulk electrodes.…”
Section: Resultsmentioning
confidence: 87%
“…In a previous study carried out in argon, enhancement factors of more than 1000-fold were observed with the presence of the nanoparticles. 35 Above 9 kV, the plasma emission is larger for the electrodes without nanoparticles, where the applied field is strong enough to initiate a plasma from the bulk electrodes. Here, the Au nanoparticle film creates a shunt of the externally applied field applied between the copper electrodes.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…Here, we utilize a transient pulsed plasma discharge in a glass-slide plasma-based reactor, which consists of two parallel copper electrodes separated by an approximately 5 mm gap (see Figure ). Further details are given in the Supporting Information.…”
mentioning
confidence: 99%