2024
DOI: 10.1021/acsnano.3c10204
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Nanopatterned Monolayers of Bioinspired, Sequence-Defined Polypeptoid Brushes for Semiconductor/Bio Interfaces

Beihang Yu,
Boyce S. Chang,
Whitney S. Loo
et al.

Abstract: The ability to control and manipulate semiconductor/bio interfaces is essential to enable biological nanofabrication pathways and bioelectronic devices. Traditional surface functionalization methods, such as self-assembled monolayers (SAMs), provide limited customization for these interfaces. Polymer brushes offer a wider range of chemistries, but choices that maintain compatibility with both lithographic patterning and biological systems are scarce. Here, we developed a class of bioinspired, sequence-defined … Show more

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Cited by 4 publications
(2 citation statements)
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“…The surface characterization of polymer brushes is vital to understand the underlying chemical and mechanical properties. Non-invasive characterization techniques such as atomic force microscopy (AFM) [ 47 , 48 , 49 ], photo-induced force microscopy (PiFM) [ 50 ], angle-resolved XPS, and NEXAF are a few techniques that are often used. AFM and PiFM are scanning probe techniques.…”
Section: Surface Characterizationmentioning
confidence: 99%
See 1 more Smart Citation
“…The surface characterization of polymer brushes is vital to understand the underlying chemical and mechanical properties. Non-invasive characterization techniques such as atomic force microscopy (AFM) [ 47 , 48 , 49 ], photo-induced force microscopy (PiFM) [ 50 ], angle-resolved XPS, and NEXAF are a few techniques that are often used. AFM and PiFM are scanning probe techniques.…”
Section: Surface Characterizationmentioning
confidence: 99%
“…PiFM is essentially AFM equipped with an optical system to probe molecular resonance. It has the ability to spatiochemically image specific domains [ 50 ]. Polymer blends do not usually have the ability to respond to resonant Raman enhancement where long-signal integration is required [ 58 ].…”
Section: Surface Characterizationmentioning
confidence: 99%