2011
DOI: 10.1116/1.3536839
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Nanopatterning by block copolymer micelle nanolithography and bioinspired applications

Abstract: This comprehensive overview of block copolymer micelle nanolithography (BCMN) will discuss the synthesis of inorganic nanoparticle arrays by means of micellar diblock copolymer approach and the resulting experimental control of individual structural parameters of the nanopattern, e.g., particle density and particle size. Furthermore, the authors will present a combinational approach of BCMN with conventional fabrication methods, namely, photolithography and electron beam lithography, which combines the advanta… Show more

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Cited by 121 publications
(155 citation statements)
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“…Metal ions are loaded in the hydrophilic part of the amphiphilic block copolymer, and metal nanoparticles are formed in amphiphilic block copolymer inverse micelles. 64 Au nanoparticles in poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) inverse micelles have also been reported.…”
Section: Motivation Formentioning
confidence: 99%
“…Metal ions are loaded in the hydrophilic part of the amphiphilic block copolymer, and metal nanoparticles are formed in amphiphilic block copolymer inverse micelles. 64 Au nanoparticles in poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) inverse micelles have also been reported.…”
Section: Motivation Formentioning
confidence: 99%
“…The lateral distance between individual gold nanoparticles can be adjusted between ∼20 and 300 nm, simply by altering the production parameters. [154][155][156] Specific biofunctionalization of the gold nanoparticles is enforced by either passivating the area in between the gold nanoparticles by covalent attachment of PEG or by transferring the nanoparticle arrays to PEG hydrogels. Next, the gold nanoparticles are specifically functionalized via thiol chemistry with a biomolecule of choice.…”
Section: Nanopatternmentioning
confidence: 99%
“…Photolithography and EBL can also be combined with different nanoparticle self-assembly phenomena. For example, Spatz et al developed block copolymer micelle deposition on different types of surfaces [37]. This so-called block copolymer micelle nanolithography is in particular advantageous for functionalized inorganic nanoparticle array formation when the desired feature size is in the range from 1 to 12 nm.…”
Section: Conventional Fabrication Methodsmentioning
confidence: 99%