Nanopatterning by Laser Interference Lithography: Applications to Optical Devices

Abstract

A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.

Mechanotunable Plasmonic Properties of Colloidal Assemblies

“…Suitable templates for colloidal assembly can be prepared by various methods of which we want to highlight laser interference lithography (LIL) . Figure a depicts the use of LIL in combination with CAPA to produce a plasmonic lattice.…”

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

“…For the samples with photoresist only, the width of the pillar is continuously reduced at a position close to the substrate surface. By adding an ARC at the bottom of the photoresist, the patterns’ uniformity and stability are greatly improved . It can reduce the inconsistent shapes and irregular wall surfaces, preventing the possibility of the collapse of the structures.…”

Development of a High-throughput Micronanopatterning System Based on the Plastic Deformation Driven by Continuous Rigid Mold Edge Inscribing on Flexible Substrates

“…마이크로나노패터닝(micro-and nanopatterning) 기술은 초정 밀기계, 광학, 정보통신, 센싱, 바이오, 환경, 에너지 변환 등 다양 한 분야의 신소자 개발 및 성능 혁신에 활발히 도입 응용됨 [1][2][3][4] 과 더불어 다른 나노소재의 활용도와 기능성을 높이기 위한 가공 기술 로도 널리 도입되고 있다 [5,6] . 그러나 종래 photolithography를 비 [1,[7][8][9] .…”