Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Miyake, Takeo; Takenaka, Takashi; Kato, Koichi; Hosaka, Takumi; Kanari, Yuzo; Sonobe, Hironori; Ohdomari, Iwao

doi:10.1016/j.cplett.2006.05.074

Cited by 12 publications

(18 citation statements)

References 16 publications

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“…Oxidations have been utilized to introduce hydroxyl or acid functionalized moieties on SAMs, 35,62,64,[147][148][149] which can be used for esterification reactions described above to introduce other molecules as summarized in Fig. 12.…”

Section: Surface Chemistrymentioning

confidence: 99%

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

2010

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Self-assembled monolayers (SAMs) have received increasing attention since their introduction 30 years ago. Soon it was discovered that they can be used as alternative resist materials and are compatible with different established lithographic techniques commonly used in silicon semiconductor technology. Besides these possibilities to structure SAMs, other attractive properties emerged from the use of SAMs. E.g., the introduction of addressability into the patterns by selective functionalization with reactive precursor molecules and/or by applying suitable surface reactions was established. In this feature we highlight developments of photolithographic techniques that have been used in combination with SAMs serving either as resists for the patterning process or as precursor molecules for surface reactions, which can be performed on non-structured and mainly photochemically structured surfaces to obtain multifunctional surfaces with tunable surface properties. The aim is to provide an overview about the versatile possibilities to use silane based SAM systems to structure silicon-oxide substrates by introducing topographical as well as chemically heterogeneous surface structures. In particular the chemical activation of SAMs includes a large number of functionalization concepts which are intended to be summarized in this review. They will be introduced here according to the class of chemical reaction that has been used. Therefore, an introduction into the plethora of possible structures, which have been created by the combination of photolithographic structuring approaches, and the integration of tailor made surface functionalities into these systems will be highlighted. Additionally effective strategies to implement a diversity of chemical functionalities onto one substrate are summarized.

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Section: Surface Chemistrymentioning

confidence: 99%

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

2010

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“…The most popular SAM resist is based on trichloro-silane that bonds readily to −OH terminated substrate . However, SAM resists are too thin (typically 1–2 nm) for acting as dry etching mask; and they have very low sensitivity, typically one order lower than that of PMMA . Additionally, long-term stability of SAMs is limited for a range of reagents/media. , …”

Section: Introductionmentioning

confidence: 99%

Grafted Polystyrene Monolayer Brush as Both Negative and Positive Tone Electron Beam Resist

et al. 2017

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Although spin coating is the most widely used electron-beam resist coating technique in nanolithography, it cannot typically be applied for nonflat or irregular surfaces. Here, we demonstrate that monolayer polystyrene brush can be grafted on substrates and used as both positive and negative electron-beam resist, which can be applied for such unconventional surfaces. Polystyrene is a popular negative resist when using solvent developer but solvent cannot be used for grafted polystyrene brush that is firmly bonded to the substrate. Instead, we employed two unconventional development methods to lead polystyrene brush to positive or negative tone behavior. Negative tone was achieved by thermal development at 300 °C because exposed thus cross-linked polystyrene brush is more thermally stable against vaporization than unexposed linear one. Surprisingly, positive tone behavior occurred when the brush was grafted onto an aluminum (Al) layer and the film stack was developed using diluted hydrofluoric acid (HF) that etched the underlying Al layer. By transferring the patterns into the silicon (Si) substrates using the thin Al layer as a sacrificial hard mask for dry etch, well-defined structures in Si were obtained in two different electron-beam resist tones as well as in nonflat surfaces.

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“…SAMs can be chemically patterned at the nanometer scale by a variety of methods, and these chemical patterns can then be developed through either covalent or noncovalent interactions with molecules, nanoparticles, and biomolecules. [3][4][5][6][7][8][9][10][11] One direct strategy to pattern SAMs is to utilize them as resist materials for various forms of lithography. 3,[6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21] There has been a significant research effort in recent decades in developing SAMs as electron beam resists with nanoscale resolution.…”

Section: Introductionmentioning

confidence: 99%

“…3,[6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21] There has been a significant research effort in recent decades in developing SAMs as electron beam resists with nanoscale resolution. 3,[6][7][8][12][13][14][15][18][19][20][21][22] These research efforts on SAMs complement work to develop "unconventional" electron beam lithography ͑EBL͒ resists. 23 The damage mechanisms on several SAMs have been elucidated in considerable detail.…”

Section: Introductionmentioning

confidence: 99%

Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide

Gao

Bernstein

Lieberman

2009

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inComparative assessment of the stability of nonfouling poly(2-methyl-2-oxazoline) and poly(ethylene glycol) surface films: An in vitro cell culture study Biointerphases 9, 031003 (2014); 10.1116/1.4878461Understanding the nonfouling mechanism of surfaces through molecular simulations of sugar-based selfassembled monolayers Electric field induced switching of poly(ethylene glycol) terminated self-assembled monolayers: A parallel molecular dynamics simulation

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Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Cited by 12 publications

References 16 publications

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

Grafted Polystyrene Monolayer Brush as Both Negative and Positive Tone Electron Beam Resist

Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide

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