Nanoprocessing of Carbon and Boron Nitride Nanoperiod Multilayer Films

Abstract

A new low-dielectric-constant spin-on glass (SOG) with a k value of 2.4 has been developed for a gap-filling process in advanced memory devices. The low-shrinkage characteristic of the SOG during thermal curing provides capabilities of gap filling and planarizing as high as those of conventional reflowable SOGs. The low-shrinkage SOG has thermal stability up to 800 C and chemical stability against diluted hydrofluoric acid, sulfuric acid-hydrogen peroxide, and amine-based solutions, which makes it possible to be used as an interlevel dielectric of memory devices. Tungsten and aluminum interconnects fabricated using the low-shrinkage SOG showed a parasitic capacitance 30% lower than those fabricated using silicon dioxide and a sufficiently long line-to-line dielectric breakdown lifetime. Taking advantage of the high chemical stability of the SOG, an all-wet damageless via-formation process using an amine-based photoresist stripper has been developed. By using the process, the lowshrinkage SOG can be applied to multilevel metallization. #

Deposition and Tribology of Carbon and Boron Nitride Nanoperiod Multilayer Hard and Solid Lubricating Films

“…The modulus of dissipation was calculated by dividing the dissipated energy by the total energy (Donohue et al, 1995;Miyake, 2005). The hardness was evaluated from the plastic deformation depth which was determined from the point of intersection of the straight line fitted to the appropriate unloading curve and the x axis (Doerner & Nix, 1986;Syed Asif et al, 1999;Miyake & Kim, 2003). The total deformation energy of nanoindentation was calculated as the integral of the loading curve.…”

Silicon Nanofabrication by Atomic Force Microscopy-Based Mechanical Processing

“…Using microtribological action and degrees of freedom of materials, the shape and size of processed objects can increase if shape processing is achievable at the micron and nanometer scales [4,5]. Therefore, microfabrication applications can be significantly extended through such novel processes [2][3][4][5][6][7][8][9][10].…”

“…Therefore, the damage remained superficial [18][19][20][21]. In contrast, the direct patterning of etching mask was proposed to reduce damage [8][9][10][11].…”

Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering

“…The dissipated energy was evaluated as the total energy minus the storage energy. The modulus of dissipation was calculated by dividing the dissipated energy by the total energy [18,25].…”

“…This is particularly due to nanoperiod multilayer films with complex microstructures. Scanning force microscopy (SFM) in combination with the use of diamond-tipped cantilevers can be used to scan or indent surfaces to explore the possibility of high-precision processing on such thin layers and to study mechanical processing characteristics [12,18]. Conductive atomic force microscopy (CAFM) can directly determine a local conductivity distribution using a boron-doped conductive diamond tip, which is independent of topographic information [19].…”