2016
DOI: 10.1039/c5sm02435h
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Nanoscale adsorbed structures as a robust approach for tailoring polymer film stability

Abstract: The stability or wettability of thin polymer films on solids is of vital interest in traditional technologies as well as in new emerging nanotechnologies. We report here that nanoscale structures of polymer chains adsorbed onto a solid surface play a crucial role in the thermal stability of the film. In this study, polystyrene (PS) spin-cast films (20 nm in thickness) with eight different molecular weights prepared on silicon (Si) substrates were used as a model. When low molecular weight (Mw≤ 50 kDa) PS films… Show more

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Cited by 57 publications
(138 citation statements)
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“…The raw Si (100) wafers (purchased from University Wafer Inc.) were precleaned using a hot piranha solution (i.e., a mixture of H 2 SO 4 and H 2 O 2 , caution: a piranha solution is highly corrosive upon contact with skin or eyes and is an explosion hazard when mixed with organic chemicals/materials; extreme care should be taken when handing it) for 30 min, and were subsequently rinsed with deionized water thoroughly. Previous X‐ray reflectivity (XR) study proved that a native oxide (SiO x ) layer of about 2 nm in thickness was formed at the substrate surface with a surface roughness of less than 0.5 nm after the piranha solution cleaning . Hereafter, this substrate was assigned as “native oxide Si.” The water contact angle of the native oxide Si (just before spin‐coating of polymer films) was estimated to be less than 10°.…”
Section: Methodsmentioning
confidence: 99%
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“…The raw Si (100) wafers (purchased from University Wafer Inc.) were precleaned using a hot piranha solution (i.e., a mixture of H 2 SO 4 and H 2 O 2 , caution: a piranha solution is highly corrosive upon contact with skin or eyes and is an explosion hazard when mixed with organic chemicals/materials; extreme care should be taken when handing it) for 30 min, and were subsequently rinsed with deionized water thoroughly. Previous X‐ray reflectivity (XR) study proved that a native oxide (SiO x ) layer of about 2 nm in thickness was formed at the substrate surface with a surface roughness of less than 0.5 nm after the piranha solution cleaning . Hereafter, this substrate was assigned as “native oxide Si.” The water contact angle of the native oxide Si (just before spin‐coating of polymer films) was estimated to be less than 10°.…”
Section: Methodsmentioning
confidence: 99%
“…Note that all the native oxide Si substrates were treated with exactly the same protocol to avoid possible differences in the surface chemistry of the oxide layer that affects the stability of PS thin films . The “interfacial sublayer” (composed of the loosely adsorbed chains and flattened chains, as illustrated in the top part of Figure c) and “flattened layer” (composed of the lone flattened chains, as illustrated in the bottom part of Figure c) on the native oxide Si were prepared independently by the established protocol: first, PS thin films (≈6 R g in thickness) were annealed at T >> T g for given times (up to 144 h) in an oil‐free vacuum oven (below 10 −3 Torr). To extract the interfacial sublayer, the annealed PS films were then solvent leached in baths of fresh toluene at room temperature until no obvious change in thickness was observed (typically a total of 3 cycles with 30 min per cycle).…”
Section: Methodsmentioning
confidence: 99%
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