Nanoscale Channel Gate‐Tunable Diodes Obtained by Asymmetric Contact and Adhesion Lithography on Fluoropolymers

Abstract

Adhesion lithography offers to fabrication of coplanar asymmetric nanogap electrodes with a low‐cost and facile process. In this study, a gate‐tunable diode with coplanar asymmetric nanogap is fabricated using adhesion lithography. A fluoropolymer material is introduced to the adhesion lithography process to ensure a manufacturing patterning process yield as high as 96.7%. The asymmetric electrodes formed a built‐in potential, leading to rectifying behavior. The coplanar electrode structure allowed the use of a gate electrode in vertical contact with the channel, resulting in gate‐tunable diode characteristics. The nanoscale channel induced a high current density (3.38 × 10−7 A∙cm−1), providing a high rectification ratio (1.67 × 105 A∙A−1). This rectifier diode is confirmed to operate with pulsed input signals and suggests the gate‐tunability of nanogap diodes.