Nanoscale confinement of energy deposition in glass by double ultrafast Bessel pulses

Hoyo, Jesús del; Meyer, Rémi; Furfaro, Luca; Courvoisier, F.

doi:10.1515/nanoph-2020-0457

Cited by 25 publications

(13 citation statements)

References 41 publications

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“…The evacuation of a fraction of the hot material via the void channel produced at the center of the Bessel beam, allows for quenching the relaxation and maintains the void structure even for parameters where the void would be partially or totally reclosed by the molten material around it. Recent results on double pulse illumination let us anticipate that double pulse could partially reduce the amount of the molten layer, and increase the temperature contrast between the optical axis and the surrounding lobes [35].…”

Section: Discussionmentioning

confidence: 99%

High Aspect Ratio Structuring of Glass with Ultrafast Bessel Beams

et al. 2021

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Controlling the formation of high aspect ratio void channels inside glass is important for applications like the high-speed dicing of glass. Here, we investigate void formation using ultrafast Bessel beams in the single shot illumination regime. We characterize the morphology of the damages as a function of pulse energy, pulse duration, and position of the beam inside fused silica, Corning Eagle XG, and Corning Gorilla glass. While a large set of parameters allow for void formation inside fused silica, the operating window is much more restricted for Eagle XG and Gorilla glass. The transient formation of a molten layer around voids enables us interpreting the evolution of the morphology with pulse energy and duration.

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Section: Discussionmentioning

confidence: 99%

High Aspect Ratio Structuring of Glass with Ultrafast Bessel Beams

et al. 2021

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“…We attribute this effect to the impossibility for the ablated matter to be evacuated out of the hole in this regime of confined bulk ablation. [42,43] Increasing the energy should yield a larger volume of ablated matter, but which is further redeposited on the walls of the hole, thus strongly limiting the increase of the obtained hole diameter. Therefore, we cannot expect a direct correspondence between the local fluence profile and the hole diameter so that fitting the data for the hole diameter d with a threshold-based method would not be physically meaningful.…”

Section: Threshold-based Analysismentioning

confidence: 99%

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Liu

Clady

Grojo

et al. 2023

Adv Materials Inter

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face plasmon resonances, and fostered the development of advanced sensors. [2,3] Fabricated on dielectric materials, arrays of nano-holes -and more generally regularly-ordered structures composed of subwavelength-diameter holes -form the basis of the architecture of integrated two-dimensional photonic crystals and all-dielectric metasurfaces, able to confine and manipulate light at unprecedented levels (including amplitude, spectral and spatial management). [4] The usual technological approaches for such nanofabrication of both plasmonic and all-dielectric nanostructures rely on various tools and approaches, amongst which focused ion beam, electron beam, photolithography, reactive ion etching, etc. [5,6] These fabrication methods are mature and highly performant, however, they are slow and they require several steps and techniques that need to be optimized for each material used, thereby inevitably increasing the overall costs and complexity of the whole process.Future advanced devices are now calling for making use of the third dimension (Z) in addition to perfectly well controlled planar nanopatterns (in X and Y dimensions). [7] In particular, arrangements made of arrays of nanoholes with depths reaching at least several micrometers may greatly broaden the range of possible designs and functionalities of nanophotonic structures. [7,8] However, the technological fabrication of such deep holes with a cylindrical profile at the surface of materials is challenging. [9][10][11][12] Thus, introducing a versatile fabrication technique that adds the hole depth as a straightforward and independent degree of freedom holds promises to form advanced architectures. In this context, we explore ultrafast laser processing as a direct way to create deep air holes at the surface of a reference dielectric material, fused silica. By "direct" we mean that one hole is fabricated by a single-step process, consisting in only one laser shot to ablate matter, without any extra treatment (like chemical etching for example [13] ) nor translation of the target material. [14] Although the ultimate spatial resolution of direct laser ablation with ultrashort pulses has not reached yet sufficient performance standards to compete with traditional nanofabrication processes to fabricate functional nanophotonic components, our aim is to show it represents a route for an alternative and complementary solution with attractive advantages in terms of speed, maskless and single-step process, absence of need of vacuum environment or chemicals. Additionally, the nanostructures can be fabricated on a single

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“…[34] The pressure and temperature on the tube increase sharply, potentially up to the warm dense matter regime. [38,41] This leads to radial forces toward the tube center and outward, as in the case of surface excitation by an optical vortex. [42] In our case, a long column of material is pressurized, and the relaxation involves material transfer from bulk across the surface.…”

Section: Formation Mechanism Of the Nano-pillarsmentioning

confidence: 99%

“…A proof-of-principle has already been obtained in glass by Xie et al, with a single pulse shaped as a higher-order Bessel beam with circular polarization to generate a high-refractive index rod inside the bulk of glass. [37] Recent results have shown that zeroth-order Bessel beams induce, in a single shot, a very high energy density plasma, [38] thanks to the process of resonance absorption, [39] which occurs for polarization oriented perpendicular to the nano-plasma rod. With the aim of generating extreme states of matter, we have used a radially-polarized first-order Bessel beam, with a focal region shaped as a high-aspect ratio cylinder with an 800 nm diameter.…”

Section: Introductionmentioning

confidence: 99%

“…Recent results have shown that zeroth‐order Bessel beams induce, in a single shot, a very high energy density plasma, [ 38 ] thanks to the process of resonance absorption, [ 39 ] which occurs for polarization oriented perpendicular to the nano‐plasma rod. With the aim of generating extreme states of matter, we have used a radially‐polarized first‐order Bessel beam, with a focal region shaped as a high‐aspect ratio cylinder with an 800 nm diameter.…”

Section: Introductionmentioning

confidence: 99%

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Single Shot Generation of High‐Aspect‐Ratio Nano‐Rods from Sapphire by Ultrafast First Order Bessel Beam

Belloni,

Hassan,

Furfaro

et al. 2023

Laser & Photonics Reviews

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Engineering the polarization and spatial phase of ultrafast laser pulses represents a compelling strategy for enhancing control over laser–matter interaction and enabling rapid and innovative nano‐fabrication processes. Here, the single‐shot, ultrafast laser fabrication of high‐aspect‐ratio, vertically standing nano‐pillars with a diameter of ≈800 nm and height up to 15 µm on the surface of sapphire, is reported. To achieve this, the distinctive properties of diffraction‐free, first‐order Bessel beams endowed with either radial or azimuthal polarization distributions, are harnessed under tight focusing conditions. The highly intense laser–matter interaction in this configuration generates a tubular‐shaped, high‐pressure field beneath the material surface, leading to the rapid expulsion of material across the surface. Three distinct regimes for the pillar generation are identified in addition to a mechanism based on the Rayleigh‐Plateau theory that explains the distinct morphological regimes observed. The findings not only shed light on the underlying physical mechanisms of intense excitation of transparent dielectrics but also offer exciting prospects for the rapid fabrication of positive nano‐structures and material compression across various fields of application.

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Nanoscale confinement of energy deposition in glass by double ultrafast Bessel pulses

Cited by 25 publications

References 41 publications

High Aspect Ratio Structuring of Glass with Ultrafast Bessel Beams

High Aspect Ratio Structuring of Glass with Ultrafast Bessel Beams

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Single Shot Generation of High‐Aspect‐Ratio Nano‐Rods from Sapphire by Ultrafast First Order Bessel Beam

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