“…can be produced in water by high energy electron beam irradiation and the etching mechanisms in LCTEM are very complicated. [ 14–17 ] ZnO is an amphoteric oxide which can be etched in deionized water (pH ≈ 6.7–6.9), ambient environment, H 2 O 2 , acid, and alkali solution. [ 18–22 ] Hence, most radicals (H 2 O 2 , H 3 O + , OH•, HO 2 •,etc.)…”